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个人简介
Holger Sailer received the Diploma degree in physics and the Ph.D. degree with a focus on high-resolution electron beam resist from the University of Tübingen, Tübingen, Germany, in 2000 and 2007, respectively.
In 2004, he joined IMS CHIPS, Stuttgart, Germany, where he has been responsible for several projects concerning ebeam-, i-Line, and laser-lithography. Since 2017, he has been the Head of the IMS CHIPS Lithography Department.
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Markus Greul,Holger Sailer, Matthias Wahl, John Duff, Jeff Michelmann,Richard Bojko,Dmitri Titko, Konrad Rössler, Nezih Unal
Photomask Japan 2022: XXVIII Symposium on Photomask and Next-Generation Lithography Mask Technology (2022)
Advances in Patterning Materials and Processes XXXVIII (2021): 104-115
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