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Our group develops new optical materials and devices by controlling composition on length scales from 5 nm -500 nm. Electron-beam, atomic-force-microscopy (AFM), and optical lithographies are used in conjunction with a variety of etching and deposition technologies to produce 3D-textured structures in which the electronic and photonic eigenstates can be “designed” by judicious choice of patterns, length scales and material combinations. The motivation is to offer optical device engineers a more diverse range of material options when developing next and next-next generation technologies.
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论文共 247 篇作者统计合作学者相似作者
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Marco De Gregorio,Shangxuan Yu, Felix Kohr,Donald Witt,Becky Lin,Matthew Mitchell, Steffen Schlör,Lukasz Dusanowski,Christian Schneider,Lukas Chrostowski, Tobias Huber-Loyola,Sven Höfling,
Quantum Computing, Communication, and Simulation IV (2024)
ADVANCED QUANTUM TECHNOLOGIESno. 1 (2024)
Smart Photonic and Optoelectronic Integrated Circuits 2024 (2024)
Quantum Computing, Communication, and Simulation III (2023)
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APL PHOTONICSno. 12 (2023): 126109-126109-8
CoRRno. 10 (2023): 106101-106101-12
2023 IEEE 36th International Vacuum Nanoelectronics Conference (IVNC)pp.20-21, (2023)
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Joshua Fabian, Wesley Cassidy, Lesley Hill, Kassandra Hawes,David Neilson,Adan Azem,Xiruo Yan,Donald Witt,Matthew Mitchell,Andreas Pfenning,Lukas Chrostowski,Jeff F. Young
2022 IEEE Photonics Conference (IPC)pp.1-2, (2022)
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