基本信息
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职业迁徙
个人简介
Katsuhiko Nishiguchi received the B.E., M.E., and Ph.D degrees in electrical engineering, in 1998, 2000, and 2002, respectively, from the Tokyo Institute of Technology, Tokyo, Japan.
Since 2002, he has been with Nippon Telegraph and Telephone Corporation, where he is currently a Senior Research Scientist and is engaged in the research on physics and technology of Si nanometer scale devices for large-scale integrated applications.
Dr. Nishiguchi received International Union of Pure and Applied Physics (IUPAP) Young Author Best Paper Award at the ICPS meeting in 2000, Graduate Student Award Silver at the MRS meeting, and Young Scientist Award at the Japan Society of Applied Physics (JSAP) meeting in 2000.
研究兴趣
论文共 113 篇作者统计合作学者相似作者
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期刊级别
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Journal of applied physicsno. 20 (2024)
2023 IEEE UNDERWATER TECHNOLOGY, UTpp.1-5, (2023)
Applied physics lettersno. 21 (2023)
Nature Communicationsno. 1 (2023): 1701-1701
ACS nanono. 17 (2023): 17031-17040
JOURNAL OF THE PHYSICAL SOCIETY OF JAPANno. 3 (2023)
NATURE COMMUNICATIONSno. 1 (2023)
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作者统计
#Papers: 112
#Citation: 2032
H-Index: 23
G-Index: 42
Sociability: 5
Diversity: 3
Activity: 9
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