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个人简介
Keiko Ariyoshi received the B.S. and M.S. degrees in crystalline materials science from Nagoya University, Nagoya, Japan, in 2003 and 2006, respectively.
She was with the Research and Development Center, Toshiba Corporation, Kawasaki, Japan, where she was engaged in the research on high-$k$ dielectrics for advanced Flash memories. In 2008, she was assigned to Toshiba America Electronic Components, Inc., Albany, NY, where she has been working on the research and development of high-$k$ and metal gate stacks for advanced CMOS devices.
研究兴趣
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Materials Science Forum (2015): 769-772
Materials Science Forum (2014): 935-938
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#Papers: 20
#Citation: 343
H-Index: 12
G-Index: 18
Sociability: 4
Diversity: 2
Activity: 0
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