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排名必读论文期刊顶会热点AI 简史溯源树小脉星探人才迁徙塔尖人才国防情报追踪开源工具智慧手语
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论文共 24 篇作者统计合作学者相似作者

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Optimization of Spin-on Metal Oxide Resist Performance via New Development Techniques on Sub-30nm Pitch Patterning
Lior Huli, Kanzo Kato, Steven Gueci, Nathan Antonovich, Steven Grzeskowiak, David Hetzer,Eric Liu,Alexandra Krawicz,Satoru Shimura, Shinichiro Kawakami,Soichiro Okada,Karen Petrillo,
ADVANCES IN PATTERNING MATERIALS AND PROCESSES XL (2023)
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Recent advances in EUV patterning in preparation towards high-NA EUV
Seiji Nagahara,Arnaud Dauendorffer, Arame Thiam, Xiang Liu, Yuhei Kuwahara, Cong Que Dinh,Soichiro Okada, Shinichiro Kawakami, Hisashi Genjima, Noriaki Nagamine,Makoto Muramatsu,Satoru Shimura,
ADVANCES IN PATTERNING MATERIALS AND PROCESSES XL（2023）
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Establishment of new process technology for EUV lithography
Yuhei Kuwahara, Shinichiro Kawakami, Kanzo Kato,Soichiro Okada,Yuya Kamei, Tomoya Onitsuka,Takashi Yamauchi,Nanoka Miyahara, Congque Dinh, Lior Huli,Satoru Shimura
ADVANCES IN PATTERNING MATERIALS AND PROCESSES XL (2023)
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Advanced development methods for high-NA EUV lithography
Cong Que Dinh,Seiji Nagahara, Yuhei Kuwahara,Arnaud Dauendorffer,Soichiro Okada,Seiji Fujimoto, Shinichiro Kawakami,Satoru Shimura,Makoto Muramatsu, Kayoko Cho, Xiang Liu,Kathleen Nafus,
ADVANCES IN PATTERNING MATERIALS AND PROCESSES XL (2023)
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Advanced development for contact-holes of metal-oxide resists
Cong Que Dinh,Seiji Nagahara, Kanzo Kato, Shinichiro Kawakami, Yuhei Kuwahara,Soichiro Okada, Kayoko Cho, Hikari Tomori, Junji Nakamura, Shoichi Terada,Makoto Muramatsu,Alexandra Krawicz,
INTERNATIONAL CONFERENCE ON EXTREME ULTRAVIOLET LITHOGRAPHY 2023 (2023)
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Outlook for High-NA EUV Patterning: A holistic patterning approach to address upcoming challenges
Angelique Raley, Lior Huli, Steven Grzeskowiak,Katie Lutker-Lee,Alexandra Krawicz, Yannick Feurprier,Eric Liu, Kanzo Kato,Kathleen Nafus,Arnaud Dauendorffer,Nayoung Bae, Josh LaRose,
ADVANCED ETCH TECHNOLOGY AND PROCESS INTEGRATION FOR NANOPATTERNING XI (2022)
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Coater/developer-based techniques to improve high-resolution EUV patterning
Kanzo Kato,Lior Huli, David Hetzer, Steven Grzeskowiak,Alexandra Krawicz,Nayoung Bae, Satoru Shimura,Shinichiro Kawakami, Yuhei Kuwahara, Cong Que Dinh,Soichiro Okada, Takahiro Kitano,
International Conference on Extreme Ultraviolet Lithography 2022 (2022)
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