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论文共 14 篇作者统计合作学者相似作者
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Chen Wu, Vincent Renaud,Stephane Lariviere,Stefan Decoster, Yannick Hermans,Quoc Toan Le, Hanne DeCoster,Bart Kenens, Diana Tsvetanova, Alfonso Sepulveda Marquez,Gayle Murdoch,Seongho Park,Zsolt Tokei
Extended Abstracts of the 2023 International Conference on Solid State Devices and Materials (2023)
Stéphane Larivière, S. Decoster,Sara Paolillo, Vincent Renaud, D. Tsvetanova,Bart Kenens, H. De Coster, Quoc Toan Le, Yusuke Oniki, Alfonso Sepúlveda Márquez, Karen Stiers, F. C. Seidel, Martin G. O’Toole, Mircea Dusa,Kurt Ronse,Chris Wilson
openalex(2022)
Etienne De Poortere, Nicola Kissoon,David Hellin,Stefan Decoster,Gayle Murdoch,Stephane Lariviere,Elisabeth Camerotto,Sandip Halder,Philippe Leray, Malgorzata Jurczak,Guillaume Schelcher
Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV (2021)
Nicolas Jourdan,Fabien Roze,Toshiyuki Tabata,Stephane Lariviere, Antonito Contino,Fulvio Mazzamuto,Tokei Zsolt
2020 IEEE INTERNATIONAL INTERCONNECT TECHNOLOGY CONFERENCE (IITC)pp.163-165, (2020)
Victor M. Blanco Carballo,Sara Paolillo,Marleen H. van der Veen,Stephane Lariviere,Gian Lorusso,Etienne de Poortere,Cyrus E. Tabery, Fu Qiao, Shu-yu Lai,Marc Kea, Luke wang,yu-chi Su, Joe Oh, Jim Huang, Jimmy Chen, Jonathan Huang
International Conference on Extreme Ultraviolet Lithography 2019 (2019)
Eran Amit, Jason Arjavac, P.R. Atkins, Angela Brett,Brian M. Barnes, Norman Birnstein, Sergey M. Borisov,Sascha Brose, V. Brouzet, Stefan Buhl,Benjamin Bunday,Sven Burger, Hsien-Hung Chang, Jun‐Dong Chang, Nick Chang, Alon Chen, Kai-Hsiung Chen, Cheng Zhang, Chu-Han Chiu,Kevin Chou, Hung‐Kuo Chu,James Clarke, Avi J. Cohen, Andrew Cross, Den Boef, S Desmoulins, Christophe Dezauzier, Alain C. Diebold, Hideto Dohi, J. Ducotè, Albrecht Eberle,Martin Ebert, Mark G. Eller, Fang Wei, Hans Fritz,Andreas Frommhold, L. I. Gershteǐn, Eva Giannatou,Sven Glabisch, Anna Golotsvan, V Gredy, Charles Hagen, Reza Hajiahmadi, S. Hayashi, Mark-Alexander Henn,Jan Hermans, Akiko Hirai, Katsumi Hirose, Ho‐Han Hsu, Kwang-Young Hu, Guo Cai Huang, Shang‐Yu Huang, T.J. Huisman, Joey Hunsche, Jisung Hwang, Ishikawa Masayoshi, Izawa Masayuki, J. Simon Tony, Kai Kal, Nora N. Kammer, Angela Karvtsov, N Kaufmann, Hideyuki Kazumi, Anne Kenslea, Robert S. Kern, Mehdi Kessar, Sasan Keyvani, T Kiers, Jin‐Hoi Kim, Wansoo Kim, Young‐Seok Kim, Grigory Klebanov, Dana Klein, Sung-Woo Ko, Richard Kris, P. Kruit, Stefan Kuiper,Stéphane Larivière, Le Lazzarino, Delphine Le Cunff, L Lecarpentier, Brian Lee, D. A. Lee,D.S. Lee, Ho-Se Lee, Julie Lee, Jun Lei, Bertrand Le-Gratiet, Patrick Lemaire, Shimon Levi, Susan R. Levy, John C. Lin, Yu‐Ju Lin, Rex Liu, Gian F. Lorusso, Hsiang-Lan Lung, Lu‐Fang Ma, Ruben Maas,Chris A. Mack, Jan Willem Maes, Antonio Mani,Ming Mao, Gino Marcuccilli, Melvin Mathew, T. McDaniel, Olivier Mermet, Robert Michels, A Mili,Matthieu Milléquant, Milo Renan, Hiroshi Miroku, A. Moussa, Ingrid Müller, Victoria Naipak, Dan Nelson, Duyen Thi Cam Nguyen, Nishihata Noifeld, Ondřej Novák, Ankush Oberai, Nang-Lyeom Oh, Bryan Orf, Jason W. Osborne, Alain Ostrovsky, Shyh-Shii Pai, Chan-Ha Park, Chris Park,Shin-Woong Park, Anne Pastol, Svetlana Pastur, Oliver D. Patterson, Carlos A. Pereira, Jeffrey L. Peters, C. R. M. Prentice, Jie Zhang,Ivo W. Rangelow, Ao Ren,Christoph Reuter,John Robinson, Justin Roller, Vito Rutigliani, E. A. Schweikert, Shahrjerdy Mir, Yoshiki Shiba,Yong Kong Siew,Richard T. Silver, Aileen Soco, Ewa Sommer, Hyung-Sub Son, Hans-Jürgen Stock, Su Sufrin, Weiqiang Sun, Pei Tang, Wim Tel, David Tien, Ashley Tilson, Ian Tolle, J.H. Tortai, Li-Shiuan Tsai, Stephen Tseng, Dieter Van den Heuvel, Maarten van Es,Luc van Kessel, Van Roey, Stanislav V. Verkhoturov, Alon Volfman, F Wang, Y. Wang, Wei Weintraub, R Willekers
openalex(2019)
METROLOGY, INSPECTION, AND PROCESS CONTROL FOR MICROLITHOGRAPHY XXXIII (2019)
Stephane Lariviere,Christopher J. Wilson, Bogumila Kutrzeba Kotowska,Janko Versluijs,Stefan Decoster,Ming Mao,Marleen H. van der Veen,Nicolas Jourdan,Zaid El-Mekki,Nancy Heylen,Els Kesters,Patrick Verdonck,Christophe Beral,Dieter Van den Heuvel,Peter De Bisschop,Joost Bekaert,Victor Blanco,Ivan Ciofi,Danny Wan,Basoene Briggs,Arindam Mallik,Eric Hendrickx,Ryoung-han Kim,Greg McIntyre,Kurt Ronse,Juergen Boemmels,Zsolt Tokei,Dan Mocuta
Extreme Ultraviolet (EUV) Lithography IX (2018)
V. M. Blanco Carballo,J. Bekaert,M. Mao, B. Kutrzeba Kotowska,S. Lariviere,I. Ciofi,R. Baert,R. H. Kim,E. Gallagher,E. Hendrickx, L. E. Tang,W. Gillijns,D. Trivkovic,P. Leray,S. Halder, M. Gallagher,F. Lazzarino,S. Paolillo,D. Wan,A. Mallik,Y. Sherazi,G. McIntyre,M. Dusa, P. Rusu,T. Hollink,T. Fliervoet,F. Wittebrood
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作者统计
#Papers: 14
#Citation: 38
H-Index: 4
G-Index: 6
Sociability: 6
Diversity: 0
Activity: 0
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