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个人简介
Y. M. Lin was born in Taipei, Taiwan, R.O.C., in 1968. He received the B.S. degree in electrical engineering from the Tatung Institute of Technology in 1991, the M.S. degree in electrical engineering from the National Hsin-Hua University in 1993, and Ph.D. degree in electronic engineering from the National Chiao-Tung University, Hsinchu, Taiwan, in 1997. His Ph.D. dissertation focused on process issues of interpoly-silicon dielectric and intermetal dielectric and their impacts on device reliability.
From 1994 to 1995, he worked on intermetal dielectric development for 0.35–$\mu$ m CMOS at Taiwan Semiconductor Manufacturing Company (TSMC), Hinchu. Since September 1999, he is responsible for gate quality silicon and high-k gate dielectric for 0.1–$\mu$ m CMOS at TSMC. He is now with Sematech for process development and reliability of gate quality silicon.
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论文共 29 篇作者统计合作学者相似作者
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Scientific Reportsno. 1 (2024): 1-12
Ya‐Hui Chang,Chien-Yu Lin,Ting‐Chang Chang, Yen-Sheng Lin,Kuan-Hsu Chen,Fu‐Yuan Jin,Yu‐Shan Lin,Fong‐Min Ciou,Kai‐Chun Chang,Wei‐Chun Hung,Ting-Tzu Kuo,Chien‐Hung Yeh
openalex(2021)
Physical Review Cno. 6 (2021)
Proceedings of the 2021 International Conference on Multimedia Retrieval (2021)
Fu Yuan Jin,Fong-Min Ciou,Wei-Chun Hung,Jen-Wei Huang,Chien-Yu Lin,Yu-Shan Lin,Kai-Chun Chang,Yen-Cheng Chang, Yun-Hsuan Lin,Ting-Tzu Kuo,Kuan-Hsu Chen,Wei-Chieh Hung,
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