Silicon Carrier with Deep Through-Vias, Fine Pitch Wiring and Through Cavity for Parallel Optical Transceiver

ADVANCED METALLIZATION CONFERENCE 2005 (AMC 2005)(2006)

引用 36|浏览51
暂无评分
摘要
The design, fabrication, assembly and characterization of a silicon carrier package used for enabling a Tb/s parallel optical transceiver is reported. A hierarchical approach involving eutectic AuSn and SnPb solder systems and flip chip bonding technology is used to assemble the transceiver module. The measurement and model for alignment tolerance analysis shows constant coupling efficiency from the optoelectronics (OE) devices to waveguide over a range of +/- 10 mu m, giving an excellent margin for alignment. Electrical simulations and measurement of silicon carrier through-vial shows an insertion loss of better than I dB at 20 GHz. Simulations and measurements also exhibit an attenuation of 4.3 dB/cm at 20 GHz for high speed wiring on the silicon carrier, which is adequate for 20 Gbps data transmission over a length of 7 mm.
更多
查看译文
关键词
insertion loss,data transmission,transceivers,flip chip,optoelectronic devices,form factor
AI 理解论文
溯源树
样例
生成溯源树,研究论文发展脉络
Chat Paper
正在生成论文摘要