Capacitance density and breakdown voltage improvement by optimizing the PECVD dielectric film characteristics in metal insulator metal capacitors-Chin-Tsan Yeh

2015 Joint e-Manufacturing and Design Collaboration Symposium (eMDC) & 2015 International Symposium on Semiconductor Manufacturing (ISSM)(2015)

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摘要
Metal-insulator-metal (MIM) capacitors play an important role in the fields of power management IC and LCD gate driver components. [1-2] MIM is a capacitor that consists of two metal layers separated by a dielectric film. Figure 1 shows the cross-section image of a typical MIM capacitor. The dielectric film properties including refractive index, dielectric constant and bonding structure which dominate the MIM capacitance density and breakdown performance.[3].
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关键词
MIM,PECVD,silicon oxynitride,silicon nitride,capacitance density,breakdown voltage
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