谷歌浏览器插件
订阅小程序
在清言上使用

Sram Puf Quality And Reliability Comparison For 28 Nm Planar Vs. 16 Nm Finfet Cmos Processes

2017 IEEE International Reliability Physics Symposium (IRPS)(2017)

引用 9|浏览37
暂无评分
摘要
SRAM physical unclonable function (PUF) provides a low-cost security key to address hardware attacks such as cloning as well as for reliability tracking of ICs in the field. In this work the quality and aging reliability of 28 nm high-K metal gate planar and 16 nm FinFET based SRAMs are discussed in detail with regards to their use in PUF. Data indicates that 16 nm FinFET process has a better SRAM PUF quality without any design modifications compared to the 28 nm planar process. In addition, the aging-induced bit instability is shown to be a reasonably small percentage of the overall bit counts.
更多
查看译文
关键词
SRAM,PUF,Aging,Planar CMOS,FinFET
AI 理解论文
溯源树
样例
生成溯源树,研究论文发展脉络
Chat Paper
正在生成论文摘要