High performance MOCVD for micro LED applications

Veeco MOCVD solutions are capable of supporting multiple substrates (GaAs, InP, sapphire, Si), and offer seamless transition to larger substrate sizes. For 6” GaAs red micro LED, Lumina® has demonstrated total population wavelength yield of >95% in 3 nm bin with defectivity 2um and 25% higher throughput than other platforms. For 6” sapphire miniLED, EPIK® has demonstrated within wafer wavelength 1sigma uniformity of 0.68nm (blue) / 1.24nm (green). For microLED on 200mm and 300mm silicon, Veeco has developed Propel® single wafer reactor for best in-class uniformity. Details of the technology and current data will be discussed.