Nitrogen-Polar Polarization-Doped Field-Effect Transistor Based on Al0.8Ga0.2N/AlN on SiC With Drain Current Over 100 mA/mm
IEEE Electron Device Letters(2019)
摘要
This letter reports the demonstration of N-polar Al
0.8
Ga
0.2
N/AlN continuously-graded-channel polarization-doped field-effect transistors (PolFETs) on SiC. A PolFET with a source to drain distance of
$12~\mu \text{m}$
exhibited a maximum drain current of 62.8 mA/mm and an ON/OFF current ratio of
$1.1\times 10^{{4}}$
. The maximum drain current was stable between 20 °C and 250 °C operating temperatures. With the addition of 30-nm-thick Al
2
O
3
gate insulator the maximum drain current increased to 126 mA/mm.
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关键词
Aluminum gallium nitride,Wide band gap semiconductors,Logic gates,HEMTs,MODFETs,Aluminum nitride
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