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Memory Array Demonstration of Fully Integrated 1T-1C FeFET Concept with Separated Ferroelectric MFM Device in Interconnect Layer.

2022 IEEE Symposium on VLSI Technology and Circuits (VLSI Technology and Circuits)(2022)

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摘要
In our work we describe and demonstrate an alternative approach of integrating 1T-1C FeFET having separated transistor (1T) without modifying frontend CMOS technology and an additional gate-coupled ferroelectric (FE) capacitor (1C) embedded in the interconnect layers. Starting from the results of FE capacitor integration and 1T-1C single cell characterization this paper describes realization and results of a fully integrated 8 kbit memory array implementation.
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关键词
FeFET,ferroelectric memory,hafnium oxide
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