Deep UV transparent conductive Si-doped Ga2O3 thin films grown on Al2O3 substrates
APPLIED PHYSICS LETTERS(2023)
摘要
beta-Ga2O3 is attracting considerable attention for applications in power electronics and deep ultraviolet (DUV) optoelectronics owing to the ultra-wide bandgap of 4.85 eV and amendable n-type conductivity. In this work, we report the achievement of Si-doped beta-Ga2O3 (Si:beta-Ga2O3) thin films grown on vicinal a-Al2O3 (0001) substrates with high electrical conductivity and DUV transparency of promising potential as transparent electrodes. The use of Al2O3 substrates with miscut angles promotes step-flow growth mode, leading to substantial improvement of crystalline quality and electrical properties of the Si:beta-Ga2O3 films. A high conductivity of 37 S center dot cm(-1) and average DUV transparency of 85% have been achieved for 0.5% Si-doped film grown on a 6 degrees miscut substrate. High-resolution x-ray and ultraviolet photoemission spectroscopy were further used to elucidate the surface electronic properties of the grown Si:beta-Ga2O3 films. An upward surface band bending was found at the surface region of Si:beta-Ga2O3 films. Interestingly, all the Si:beta-Ga2O3 films have a very low work function of approximately 3.3 eV, which makes Si:beta-Ga2O3 suitable materials for efficient electron injection. The present Si:beta-Ga2O3 films with high conductivity, DUV transparency, and low work function would be useful as the DUV transparent electrode to develop advanced DUV optoelectronic devices.
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关键词
al2o3 substrates,ga2o3,thin films,si-doped
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