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Improvement of Low-Frequency Noise Behavior with Chloridic Precursor Materials at ALD Process

Daniel Hessler,Ricardo Olivo, Tim Baldauf,Konrad Seidel,Raik Hoffmann, Chaiwon Woo,Maximilian Lederer,Yannick Raffel

Memories - Materials, Devices, Circuits and Systems（2024）

Cited 0|Views17
Key words
Flicker noise,Hafnium oxide,ALD process,Scattering factor,Main noise source
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