Comparative Advantages of 2T-nC FeRAM in Empowering High Density 3D Ferroelectric Capacitor Memory

2023 International Electron Devices Meeting (IEDM)(2023)

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摘要
In this work, we study ferroelectric capacitor memories and demonstrate comparative advantages of 2T-nC (Two transistors-n metal-ferroelectric-metal (MFM) capacitors) in scalability, reliability, and feasibility of dense 3D integration and operation. We show that: i) the sensing and scalability issues of conventional 1T-1C FeRAM rooted in its charge-based sensing; ii) 1T-1C FeMFET suffers from the poor reliability and scaling challenges; iii) the 2T-nC structure can be exploited to address their issues in scalability, density and reliability; iv) through comprehensive experimental and theoretical studies, the design space of 2T-nC devices is explored; v) the integration and operation of 2T-nC FeRAM arrays in 2D and 3D configurations is investigated, demonstrating their potential for improved density and operation.
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关键词
Ferroelectric Capacitor,Scalable,Poor Reliability,Scalability Issues,3D Configuration,Target Cells,Reading Process,Atomic Layer Deposition,Non-volatile Memory,Dry Etching,Ferroelectric Materials,3D Array,Memory Window,Ferroelectric Field-effect Transistor
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