Recent advances in large language models (LLMs) suggest strong potential for automating analog circuit design. Yet most LLM-based approaches rely on a single-model loop of generation, diagnosis, and correction, which favors succinct summaries over domain-specific insight and suffers from context attrition that erases critical technical details. To address these limitations, we propose AnalogAgent, a training-free agentic framework that integrates an LLM-based multi-agent system (MAS) with self-evolving memory (SEM) for analog circuit design automation. AnalogAgent coordinates a Code Generator, Design Optimizer, and Knowledge Curator to distill execution feedback into an adaptive playbook in SEM and retrieve targeted guidance for subsequent generation, enabling cross-task transfer without additional expert feedback, databases, or libraries. Across established benchmarks, AnalogAgent achieves 92
The ever-growing demand for data bandwidth is driving the exploration of new multiplexing dimensions in optical communications. Orbital angular momentum (OAM) multiplexing is promising, but hindered by charge-dependent vortex-beam size and bulky external multiplexers. Here, we report a chip-scale solution that addresses both challenges. We monolithically integrate 3D-nanoprinted microphase plates onto vertical-cavity surface-emitting laser (VCSEL) arrays to realize ultracompact, addressable sources of perfect vortex beams (PVBs). Integrated phase plates combine spiral, axicon, and lens functions, directly generating PVBs with consistent ring diameter. We demonstrate scalable one- and two-dimensional arrays emitting distinct PVB channels, including an ultradense 100 & times; 100 mu m(2) array with independently addressable four OAM states. The dense pitch enables multiple PVBs to couple directly into a standard multimode fiber with >50% efficiency per channel, without any external multiplexing optics. This integrated platform removes bulk components and simplifies OAM generation and combining, paving the way for practical, high-capacity, and miniaturized OAM-multiplexed transmitters.
Plasmonic lithography has the characteristic of breaking through the diffraction limit, but it is not a “perfect imaging”, that is, it cannot perfectly restore the information of the “object” (mask pattern), and there is an optical proximity effect similar to that in projection lithography. Therefore, it is necessary to optimize the mask pattern by using plasmonic lithography optical proximity correction (OPC) technology to achieve the purpose of reducing the pattern error (PE) and improving the imaging fidelity. This paper proposes a fast model-based OPC method for plasmonic lithography. This method is based on the imaging model established by the improved rigorous coupled wave analysis (RCWA) method, and the optimization process is based on the movement of edges. Based on the edge placement error (EPE) in the previous iteration, the movement of the edge fragments in the next iteration is determined. This feedback closed loop enables OPC to gradually approach the target, and it can converge quickly in about 7 iterations. The simulation experiments show that about 7 iterations can achieve an average reduction of about 76% in the sum of the absolute values of EPE sum_|EPE| and 71% in PE. And for patterns with different line width sizes, the OPC method proposed in this paper has good compatibility. The above results effectively verify the efficiency and effectiveness of the OPC method proposed in this paper.
Abstract This study investigates the read after write delay (RAWD) in HfZrO ferroelectric field-effect transistors (FeFETs) with a 5 Å HfO 2 insertion layer at the HfZrO 2 /SiO 2 interface. Three types of traps with distinct time constants in the FeFETs are identified via the transient current method. The positions of these traps are determined by analyzing how their time constants vary with gate and drain filling voltages. The RAWD is primarily associated with the DP1 trap close to the Si/SiO 2 interface.
