The paper describes the design of a microscope for studying a betatron radiation source based on the PEARL femtosecond laser complex in the SXR and EUV wavelength range. The main optical element of the microscope is a spherical Schwarzschild objective a x5 magnification. The device allows to study the size and spatial structure of the interaction area of laser radiation with matter, at a selected wavelength in the EUV or SXR range with a resolution of delta x=2.75 μm. The operation wavelength (λ=13.5 nm) is set by multilayer X-ray mirrors. Thin-film absorption filters are used to suppress the background component of the signal. Keywords: SXR and EUV radiation, betatron radiation, imaging x-ray optics, SXR microscope.

The research methods and the first results obtained in the study of the roughness of single-crystal silicon (111) substrates processed at the final stage by various methods are described: traditional polishing without the use of chemical-mechanical polishing (CMP), with the use of CMP and without CMP, but with the use of oxide cerium nanopowders. The efficiency of using CeO2 nanopowders has been demonstrated. The following effective roughness values were obtained: without CMP - 3.56 nm, with CMP - 0.54 nm, and without CMP, but with CeO2 polishing - 0.93 nm. Keywords: Surface, roughness, X-ray optics, deep grinding-polishing.

The method of manufacturing and the results of studies of a lens corrector that converts a spherical diverging front into a plane one and is intended for studying flat surfaces as part of an interferometer with a diffraction comparison wave is described. A feature of the corrector is the use of an aspherical convex surface with a maximum deviation of 200 μm from the nearest sphere. The first experimental results are presented, indicating the prospects for using ion-beam processing to improve the quality of the wavefront. After the procedure of ion-beam processing, the aberrations over the entire aperture of the corrector decreased by more than 4 times and amounted to the parameter of the height difference PV = 207 nm ( λ/3) and (RMS) = 19.2 nm ( λ/33). On an area with a diameter of 80

The paper reports on the developed technique for polishing single-crystal silicon substrates using a mechanical lap. The effective substrate roughness was obtained in the spatial frequency range of 0.025-65 μm-1 at the level of 0.37 nm and 0.18 nm at a frame size on the surface of 2x2 μm2. The result obtained is comparable with the results of chemical-mechanical and dynamic polishing of single-crystal silicon wafers for microelectronics. Keywords: Surface, roughness, synchrotron radiation, polishing.

Within the Universat program, a set of solar vacuum ultraviolet (VUV) telescopes has been developed for deployment on 6U nanosatellites. Telescopes are designed to get images of the solar corona. The spectral ranges of observations is considered, the characteristics of the nanosatellite from the point of view of the observations feasibility are opmized, the optical scheme of the telescope and VUV multilayer mirrors coatings and thin-film filters are modelled. Keywords: Nanosatellite, VUV, telescope, solar corona.

The paper considers the possibility of using the diamond-silicon carbide composite Skeleton® with a technological coating of polycrystalline silicon as a substrate for X-ray mirrors used with powerful synchrotron radiation sources (third+ and fourth generation). Samples were studied after polishing to provide the following surface parameters: root-mean-square flatness ≃ 50 nm, micro-roughness on the frame 2 µm × 2 µm σ ≃ 0.15 nm. The heat capacity, thermal conductivity and coefficient of linear thermal expansion were investigated. For comparison, a monocrystalline silicon sample was studied under the same conditions using the same methods. The value of the coefficient of linear thermal expansion turned out to be higher than that of monocrystalline silicon and amounted to 4.3 × 10−6 K−1, and the values of thermal conductivity (5.0 W cm−1 K−1) and heat capacity (1.2 J K−1 g−1) also exceeded the values for Si. Thermally induced deformations of both Skeleton® and monocrystalline silicon samples under irradiation with a CO2 laser beam have also been experimentally studied. Taking into account the obtained thermophysical constants, the calculation of thermally induced deformation under irradiation with hard (20 keV) X-rays showed almost three times less deformation of the Skeleton® sample than of the monocrystalline silicon sample.

By the method of ion-beam shape correction, a small-sized ion beam formed a non–axisymmetric aspherical profile of the collector surface for an extreme ultraviolet radiation source TEUS-S100 with a numerical aperture of NA= 0.25, PV on the surface is 36.3 microns, the surface shape accuracy by standard deviation is 0.074 microns, which allowed to obtain a focusing spot with a width of 300 microns at half-height. To solve the problem, the technological ion source KLAN-53M was upgraded – the flat ion-optical system was replaced with a focusing one. The ion-optical system consisting of a pair of concave grids with a radius of curvature of 60 mm provided the following parameters of the ion beam: the ion current is 20 mA, the width at half–height is 8.2 mm at a distance of 66 mm from the cutoff of the ion source.

A brief description of the concept of a soft X-ray microscope for the Nanoscope station, which is planned to be installed at the SKIF fourth-generation synchrotron, is given. The microscope is designed to study the structure of cells and dynamic processes in them with nanometer spatial resolution. It will use a unique absorption contrast of ~15 between carbon-containing structures and water in the spectral range of the water window, λ = 2.3–4.3 nm, which eliminates the need for contrasting and the use of fluorophores and minimizes the doses of ionizing radiation absorbed in the samples to obtain high-quality 3D images. The scanning and projection schemes of the microscope, their main technical characteristics, including the calculated spectra and parameters of the undulator source are presented, and an estimate of the absorbed doses depending on the resolution is obtained. The main advantage of the proposed concept lies in the use of an objective lens of high-aperture multilayer X-ray mirrors, which makes it possible to clearly visualize the focal section of the sample. Technically simple axial tomography will also be used to reconstruct the three-dimensional structure of frozen or dried samples. In the scanning scheme, due to a low dose of radiation, it will be possible to study living plant cells with a resolution of up to 10 nm, animals with a resolution of up to 80 nm, and cryofixed samples with a resolution of up to 5 nm. In the projection scheme, due to simultaneous observation of the entire focal XY section, the time for obtaining three-dimensional images is significantly reduced, but due to a large dose, it will be oriented mainly on the study of fixed samples.

This paper describes in detail a compact (2U format) telescope operating in the extreme ultraviolet range for studying the solar corona at a wavelength of 17.14 nm. The telescope objective has been built according to the Ritchey-Chrétien scheme with the following parameters: effective focal length of 381.3 mm, field of view of 2×2∘, and angular resolution of 11 in. Reflective multilayer Al/Be coatings were used, having 55% reflectance and a 0.4 nm spectral bandwidth. The wavefront rms error is 30 nm. An interferometric technique for controlling the shapes of the substrates and for adjusting the optical system and detector of the telescope assembly is described in detail.

The method of manufacturing and the results of studies of a lens corrector that converts a spherical diverging front into a plane one and is intended for studying flat surfaces as part of an interferometer with a diffraction comparison wave is described. A feature of the corrector is the use of an aspherical convex surface with a maximum deviation of ~ 200 μm from the nearest sphere. The first experimental results are presented, indicating the prospects for using ion-beam processing to improve the quality of the wavefront. After the procedure of ion-beam processing, the aberrations over the entire aperture of the corrector decreased by more than 4 times and amounted to the parameter of the height difference PV = 207 nm (~ λ/3) and (RMS) = 19.2 nm (~ λ/33). On an area with a diameter of 80%, the aberrations fell to the nanometer level: PV = 65 nm (~ λ/10) and RMS = 8.3 nm (~ λ/76). Keywords: lens corrector, interferometry, aspherical lens, ion-beam processing.

The article is devoted to the development of an EUV microscope using a wavelength of 13.84 nm. Due to the use of a mirror lens with a large numerical aperture, NA = 0.27, and a short depth of focus, it has been possible to carry out z-tomography of bio-samples for the first time with this type of microscope. A 3D image was reconstructed, and a pixel resolution of 140 nm was obtained. A new simple algorithm for the 3D reconstruction of absorption images from z-tomography data has been proposed that takes into account lens aberrations and a point spread function. The algorithm reduces the inverse absorption task to the corresponding well-studied task of fluorescence microscopy, with an error of 10% for cells up to 10 µm thick.

A project of an X-ray monochromator for the «SKIF» synchrotron based on two flat mirrors with multilayer reflective coatings is reported. The concept of the monochromator is based on the absence of precision mechanical systems and feedthroughs in vacuum, which significantly reduces mirror surface contamination and increases scanning accuracy. In addition, the overall structure of the device is greatly simplified in this way, which in turn leads to a significant reduction in the total cost and labor for manufacturing. The grazing angle of incidence of radiation on the mirrors in the process of scanning by photon energy varies within 0.5-1.3º. The length of the mirrors is 120 mm, the assumed size of the input beam is 1×1 mm2. A wide operating energy range, 8-36 keV, is achieved through the use of 3 strip-mirrors with coatings of different chemical composition, namely: Mo/B4C, W/B4C and Cr/Be. The article presents the X-ray optical scheme, the expected reflection coefficients and spectral selectivity of the monochromator, the results of the calculation of thermally induced surface deformations and the corresponding slope errors of the first mirror.

The paper reports on the developed technique for polishing single-crystal silicon substrates using a mechanical lap. The effective substrate roughness was obtained in the spatial frequency range of 0.025–65 µm-1 at the level of 0.37 nm and 0.18 nm at a frame size on the surface of 2х2 µm2. The result obtained is comparable with the results of chemical-mechanical and dynamic polishing of single-crystal silicon wafers for microelectronics.

A project of an X-ray monochromator for the "SKIF" synchrotron based on two flat mirrors with multilayer reflective coatings is reported. The concept of the monochromator is based on the absence of precision mechanical systems and feedthroughs in vacuum, which significantly reduces mirror surface contamination and increases scanning accuracy. In addition, the overall structure of the device is greatly simplified in this way, which in turn leads to a significant reduction in the total cost and labor for manufacturing. The grazing angle of incidence of radiation on the mirrors in the process of scanning by photon energy varies within 0.5-1.3 o . The length of the mirrors is 120 mm, the assumed size of the input beam is 1x1 mm 2 . A wide operating energy range, 8-36 keV, is achieved through the use of 3 strip-mirrors with coatings of different chemical composition, namely: Mo/B4C, W/B4C and Cr/Be. The article presents the X-ray optical scheme, the expected reflection coefficients and spectral selectivity of the monochromator, the results of the calculation of thermally induced surface deformations and the corresponding slope errors of the first mirror. Keywords: synchrotron radiation, multilayer mirror, monochromator, surface.

The paper proposes the use of diamond-carbide-silicon composite "Skeleton"® coated with amorphous silicon as substrates for multilayer X-ray mirrors for powerful synchrotron radiation sources (3rd+ and 4th generation). The surfaces with the following parameters were obtained using standard deep polishing methods: flatness at the level of RMS90%=54.2 nm; effective roughness sigmaeff~1.0 nm; high-frequency roughness sigma2х2~0.1 nm.

The paper describes the design of a microscope for studying a betatron radiation source based on the PEARL femtosecond laser complex in the SXR and EUV wavelength range. The main optical element of the microscope is a spherical Schwarzschild objective a x5 magnification. The device allows to study the size and spatial structure of the interaction area of laser radiation with matter, at a selected wavelength in the EUV or SXR range with a resolution of δx = 2.75 microns. The operation wavelength (=13.5 nm) is set by multilayer X-ray mirrors. Thin-film absorption filters are used to suppress the background component of the signal.

Within the Universat program, a set of solar vacuum ultraviolet (VUV) telescopes has been developed for deployment on 6U nanosatellites. Telescopes are designed to get images of the solar corona. The spectral ranges of observations is considered, the characteristics of the nanosatellite from the point of view of the observations feasibility are opmized, the optical scheme of the telescope and VUV multilayer mirrors coatings and thin-film filters are modelled.

We present the optical layout and actual design of a compact high-aperture referenceless point diffraction interferometer with a diffraction reference wave. The basic concept of this interferometer is based on a single-mode optical fibre with a subwave output aperture, which is used as a source of spherical reference waves. The interferometer is designed for high-precision measurements of the surface shape and aberrations of optical elements. It makes use of a diffraction reference wave and is developed for mass industrial applications. The proposed design does not require the involvement of special external conditions, and reduces the need for calibrated reference surfaces. We evaluate the performance of our interferometer for highprecision measurements and demonstrate its use by presenting results obtained from measuring the shapes of spherical references from various manufacturers and the aberration of a five lens objective.

The method of manufacturing and the results of studies of a lens corrector that converts a spherical diverging front into a plane one and is intended for studying flat surfaces as part of an interferometer with a diffraction comparison wave is described. A feature of the corrector is the use of an aspherical convex surface with a maximum deviation of ∼200 μm from the nearest sphere. The first experimental results are presented, indicating the prospects for using ion-beam processing to improve the quality of the wavefront. After the procedure of ion-beam processing, the aberrations over the entire aperture of the corrector decreased by more than 4 times and amounted to the parameter of the height difference PV = 207 nm (∼λ/3) and RMS = 19.2 nm (∼λ /33). On an area with a diameter of 80%, the aberrations fell to the nanometer level: PV = 65 nm (∼λ/10) and RMS = 8.3 nm (∼λ/76).

Описаны методы исследований и первые результаты, полученные при изучении шероховатости подложек из монокристаллического кремния (111), обработанных на финальной стадии различными способами: традиционная полировка без использования химико-механической полировки (ХМП), с использованием ХМП и без ХМП, но с применением нанопорошков окиси церия. Продемонстрирована эффективность использования нанопорошков CeO2. Были получены следующие значения эффективной шероховатости: без ХМП --- 3.56 nm, с ХМП --- 0.54 nm и без ХМП, но с полировкой CeO2 --- 0.93 nm. Ключевые слова: поверхность, шероховатость, рентгеновская оптика, глубокая шлифовка-полировка.