High-intensity pulsed ion beam (HIPIB) pretreatment is investigated to enhance TiN coating adhesion on WC-8 wt% Co cemented carbide. Irradiation at 1.5 J/cm2 refines WC grains, elevates hardness and surface roughness, and enhances the polar component of surface energy. These multi-scale modifications act synergistically to increase the critical load for coating failure. Acoustic emission reveals a unique failure precursor: an isolated peak at 116 +/- 2 N, followed by low noise until catastrophic failure at Lc 128 +/- 3 N.
The work presents the results of modification of WC-Co alloys using combination of the high intense pulsed ion beams (HIPIBs) irradiation (beam composition C+/ H+ – 85/15%, E = 200–250 keV, τFWHM) and deposition of protective coatings by high-intensity repetitively pulsed titanium low energy ion beams formed from vacuum arc plasma. Improvement of coating adhesion was provided due to pretreatment of the HIPIBs surface. The use of HIPIBs irradiation is shown as a pre-treatment method that increases the adhesion of deposited protective coatings. The influence of ion current density on the microhardness of the material is shown. The results of the effect of pulsed ion irradiation as well as thin film deposition on tribological and mechanical properties are presented. The dependences of wear resistance of tools made of modified WC-Co alloys were obtained. This work discusses the prospects for using a combination of HIPIBs irradiation with new technique of coating deposition for modification of cemented carbide alloy for machining a wide range of metal alloys.
In this work the effect of an intense pulsed ion irradiation with a high flux ∼ 1020 cm–2s–1 on structure, optical and photo-electrical properties of gallium oxide thin films have been investigated. The films were produced by the radio-frequency magnetron sputtering method and had amorphous structure. A part of deposited films was annealed in the air environment (900 °C, 1 h) for synthesis of β-Ga2O3 phase. Obtained films were subjected to the intense pulsed ion irradiation (ion energy - up to 200 keV, pulse duration - 100 ns, current density on the target - up to 30 A/cm2, number of pulses - 3). The influence of irradiation on optical absorption and photoluminescence spectra, field and temperature dependencies of dark and photoconductivity were investigated. The probable nature of growth defects is discussed, and a scheme of electronic transitions that determine optical properties is proposed.
The experimental studies of a surface discharge on the ferroelectric ceramics in argon flow are presented. The cylindrical plasma source based on barium titanate with a spiral electrode had been created for research. The influence of the gas pressure in the range of 10- 5-10- 2 Torr on the emission spectrum of plasma and characteristics of a surface discharge is established. The emission spectrum of plasma was received using the optical emission spectroscopy method. The spectrum lines corresponded to the atoms and ions of elements related to the ferroelectric (Ba, Ti, O, Ca, Zr) and residual atmosphere (Ar). The discharge characteristics were investigated by analyzing the signals of voltage and current of the discharge.
In the article a comparative analysis of the results of modification of dental implants (DI) surfaces treated by a complex method using sandblasting (SB) and high-power ion beam (HPIB) treatment is carried out. The samples of Russian-made IRIS DIs after SB and HPIB processing, as well as foreign DIs Astra and Zimmer were investigated. Micro-images of DI surfaces and data on their chemical composition on the basis of spectral analysis (SA), as well as data on the migration of impurities through the surfaces of titanium alloys were obtained. Conclusions are made about the changes that have taken place in the samples as a result of their processing by the method under consideration, as well as about the prospects of the complex technology, including SB and HPIB processing, in the development of new materials for DI.
The Zr-1%Nb alloy is widely used as a structural material for nuclear fuel assemblies of light water reactors. One of its key properties is the behavior upon a possible loss-of-coolant accident (LOCA) that can be changed by the surface modification procedures. This paper presents the research results on the effects of both high-intense pulsed ion beam (HIPIB) irradiation and high-current pulsed electron beam (HCPEB) processing on the kinetics of its oxidation at 1200 degrees C in air and steam, similar to the LOCA conditions. HIPIB irradiation led to more uniform reliefs on the sample surfaces but did not change their phase composition. However, both a and c lattice parameters decreased slightly with a simultaneous increase in microstrains. After HCPEB processing, the general patterns of changes in the modified surface layers were similar, but microcracks were found in some areas. In all studied cases, weight gains were greater after oxidation in air than those in steam. Nevertheless, diffusion of oxygen and the formation of scales occurred more slowly in the modified surface layers due to their distorted crystal lattices. The main reason for the variations was different physical processes that had occurred when the surfaces had been modified with charged ions and electrons.
The experimental studies of active plasma source are presented. The plasma was formed by an incomplete discharge on the surface of ferroelectric BaTiO 3 samples. The spectrum of the discharge was received using the optical emission spectroscopy method. The spectrum lines corresponded to the atoms and ions of elements related to the ferroelectric (Ba, Ti, O) and residual gas (N). The intensity of the spectrum lines depended on the discharge current and varied slightly depending on the residual gas in the pressure range of 10 -5 -10 -3 Torr. An increase in the gas pressure results in the slight increase in the electron temperature of excited atoms of the discharge plasma. The ion emission in a plasma source at a negative bias voltage has been studied.
In this work the influence of a short-pulsed ion irradiation with a high flux (∼ 5.5∙1019 cm–2s–1) on structure, optical and photo-electrical properties of gallium oxide thin films have been investigated. The films were produced by the radio-frequency magnetron sputtering method. A part of deposited films was annealed in the air environment (900 °C, 2 h) for synthesis of β-Ga2O3 phase. Obtained films were subjected to the short-pulsed ion irradiation (ion energy - up to 200 keV, pulse duration - 90 ns, current density on the target - up to 15 A/cm2). The influence of the annealing and the irradiation on spectral dependences of absorption, the bandgap width and the Urbach energy have been determined. It was found that irradiation leads to amorphization of crystalline β-Ga2O3 films and a significant change in optical characteristics. In addition, we measured the magnitude of surface dark and photoconductivity of the films. Also, the field and spectral dependences of the photosensitivity of the films were researched. As a result, it was established that short-pulsed irradiation improves the photoelectric properties of amorphous gallium oxide films. The reasons of it are discussed.
A self-magnetically insulated ion diode was used to produce a pulsed beam of metallic ions from explosion emission plasma. The ratio of integral transferred charge for the Al, Ti and Mo ions amounted to at least 63% to the total beam charge. The ion diode had design features, which consisted in a bladed cathode and a removable perforated anode overlay made of VT-8 alloy. Analysis of the charge to mass characteristics of beam ions and the ion current density waveforms by the time of flight methodic with use of a Faraday cup showed the content of aluminum and titanium ions in the third to fourth states of ionization. Keywords: ion diode, metal ions, magnetic spectrometer, track detector CR-39.
— The optical properties of Al–Si–N nanocomposite coatings deposited by reactive magnetron sputtering on substrates of stainless steel 12H18N10T and zirconium alloy E110 are studied. The absorption and luminescence characteristics are determined by growth defects and also depend on the type of substrate and its treatment with a powerful ion beam. Absorption and luminescence centers are identified with intrinsic defects in c -Al and a -SiN x and their simplest complexes. The effect of hydrogen absorption and 420-keV proton irradiation on the optical properties of the coatings is established. The dose dependences of the optical characteristics indicate the radiation resistance of the coatings. The radiation resistance of the coatings on zirconium alloy is slightly higher due to the stabilizing effect of silicon-containing defects.
The unique flash heating characteristics of intense pulsed ion beams (IPIB) offer potential advantages to fabricate high-performance coatings with non-equilibrium structures. In this study, titanium-chromium (Ti-Cr) alloy coatings are prepared through magnetron sputtering and successive IPIB irradiation, and the feasibility of IPIB melt mixing (IPIBMM) for a film-substrate system is verified via finite elements analysis. The experimental results reveal that the melting depth is 1.15 μm under IPIB irradiation, which is in close agreement with the calculation value (1.18 μm). The film and substrate form a Ti-Cr alloy coating by IPIBMM. The coating has a continuous gradient composition distribution, metallurgically bonding on the Ti substrate via IPIBMM. Increasing the IPIB pulse number leads to more complete element mixing and the elimination of surface cracks and craters. Additionally, the IPIB irradiation induces the formation of supersaturated solid solutions, lattice transition, and preferred orientation change, contributing to an increase in hardness and a decrease in elastic modulus with continuous irradiation. Notably, the coating treated with 20 pulses demonstrates a remarkable hardness (4.8 GPa), more than twice that of pure Ti, and a lower elastic modulus (100.3 GPa), 20% less than that of pure Ti. The analysis of the load-displacement curves and H-E ratios indicates that the Ti-Cr alloy coated samples exhibit better plasticity and wear resistance compared to pure Ti. Specifically, the coating formed after 20 pulses exhibits exceptional wear resistance, as demonstrated by its H3/E2 value being 14 times higher than that of pure Ti. This development provides an efficient and eco-friendly method for designing robust-adhesion coatings with specific structures, which can be extended to various bi- or multi-element material systems.
The tungsten surface was processed by high power pulsed ion beam at the TEMP accelerator (Cn+ ions, accelerating voltage 200 ± 10 kV, energy density of a single pulse 2.6 – 3.0 J/cm2). Changes in the relief and structure of the surface of tungsten samples were studied by scanning electron microscopy. After treatment with a powerful pulsed ion beam (MIIP), defects in the form of craters form on the surface of tungsten. The number of craters decreases with an increase in the number of impact pulses. After exposure to 3 pulses, microcraters are forms in the surface layer along the grain boundaries. After 10 pulses, there are practically no cracks on the irradiated surface. An increase in the number of pulses leads to the formation of a more equiaxed ultrafine-grained structure in the near-surface layer of tungsten.
The work studies the synergy effect of high-intensity implantation of aluminum ions and the subsequent impact of a powerful pulsed ion beam on the microstructure and properties of titanium. Specimens of titanium were implanted for 1 h at a temperature of 1170 K with an ion fluence of 1021 ions/cm2. Layers with a thickness of about 150 mu m were obtained. The energy impact was carried out by a powerful nanosecond pulsed ion beams with an ion current density on the target of 100 A/cm2. The paper presents data on changes in the elemental composition, and microstructure of ion-doped and energy-modified layers. It has been established that the additional energy impact on the ion-doped layer of a powerful pulsed beam improves microstructure at depths of about 4.31 mu m. The synergistic of high-intensity ion implantation of aluminum and the energy impact of a pulsed ion beam improves the wear resistance of titanium by eighteen folds.
A self-magnetically insulated ion diode was used to produce a pulsed beam of metallic ions from explosion emission plasma. The ratio of integral transferred charge for the Al, Ti and Mo ions amounted to at least 63% to the total beam charge. The ion diode had design features, which consisted in a bladed cathode and a removable perforated anode overlay made of VT-8 alloy. Analysis of the charge to mass characteristics of beam ions and the ion current density waveforms by the time of flight methodic with use of a Faraday cup showed the content of aluminum and titanium ions in the third to fourth states of ionization.
Поверхность тантала облучали мощным импульсным ионным пучком на ускорителе ТЕМП Томского политехнического университета (Cn+, ускоряющее напряжение 200±10 kV, плотность энергии в импульсе 2.6–3 Дж/cм2). Изменение топографии поверхности тантала после воздействия мощного импульсного ионного пучка исследовали с помощью растровой электронной микроскопии. Изменения рельефа и структуры поверхности образцов Та изучали методом сканирующей электронной микроскопии.
The effect of short-pulsed irradiation with 220 keV carbon ions for fluences of 2.2 x 10(13) - 2.1 x 10(15) cm(-2 )on the optical and electrical properties of titanium nitride films deposited by reactive magnetron sputtering on silicon and steel substrates has been studied. Relationships are obtained between the irradiation conditions and the parameters of interband absorption. A relationship has been established between the concentration of defects before and after irradiation, the degree of overlap of their levels and changes in the optical and electrical properties of the films. Reasons of high radiation resistance of the films are discussed. The optical and electrical properties of the films change during irradiation in two stages. The first stage is related to the annihilation of defects, the second stage is associated with their accumulation. Irradiation of films significantly slows down the rate of oxidation of their surface layers and stabilizes the electrical properties.
The effect of short-pulse irradiation with 200-keV carbon ions on the optical and electrical properties of aluminum-nitride films and Al–Si–N coatings with variable atomic composition deposited by reactive magnetron sputtering on a silicon substrate is investigated. Absorption and luminescence centers are associated with growth and radiation-induced defects in nitrides and their simplest complexes. A change in the properties during irradiation occurs due to the accumulation of radiation defects and their association into complexes. Ion irradiation is accompanied by intense radiation and the thermal annealing of unstable defects. The dose dependences of the coating characteristics indicate their high radiation resistance, which are slightly inferior to coatings on steel substrates. The radiation resistance of the coatings is due to the limiting effect of growth defects on defect formation, the wide band gap of nitrides and the interaction of defects.
Attempts are currently being made to use coatings, including nitride ceramics, for improving func-tional properties of nuclear fuel claddings made of zirconium alloys. However, the incompatibility of material characteristics at the metal/ceramic interfaces, residual stresses in the coatings, as well as the morphology (roughness) of the substrate surface layers cause their low adhesion. As a result, delamina-tion often occurs during operation. This issue can be solved by optimizing the deposition parameters and preliminary treatment of the substrate surfaces by various methods. The authors report changes in adhesion of CrN coatings deposited by reactive magnetron sputtering on substrates from the Zr-1%Nb alloy, pre-irradiated with a high-intensity pulsed ion beam (HIPIB). The effect of the HIPIB energy density on the morphology, phase composition, microhardness, and free surface energy levels of the modified layers is shown. Finally, changes in adhesion, assessed by scratch tests combined with acoustic emission signal processing, are presented. The results show that the crack initiation threshold decreases by 20% at low energy densities of up to 1 J/cm(2), while it increases by 25% at 2 J/cm(2).