To improve film–substrate adhesion and the tribological performance of hard coatings on Si 3 N 4 ceramics, Ti/TiN–Cu multilayer films were deposited on Si 3 N 4 substrates by magnetron sputtering. Multilayers were produced with a fixed number of deposition cycles while varying the ratio of Ti to TiN–Cu deposition times. The multilayer architecture substantially enhanced film–substrate bonding. Among the tested time ratios, Among the tested time ratios, sample F2 (Ti:TiN-Cu deposition-time ratio = 1:2) exhibited the highest second critical load (Lc2) of 27.8 N, representing a 58% increase over TiN.This sample also displayed the lowest coefficient of friction (COF) = 0.12, the narrowest wear scar width, 307.4 μm, and a reduced wear rate of 2.64 × 10 −6 mm 3 /(N·m). These results indicate that strengthening film adhesion concurrently lowers both friction and wear.

Ti/TiN-Cu multilayer films with 2, 6, 10, and 14 modulation cycles were deposited on Si3N4 ceramic substrates by magnetron sputtering, and the effects of the modulation cycle number on the microstructure, mechanical properties, and tribological behavior of the films were investigated. The phase composition and microstructure were analyzed by scanning electron microscopy (SEM) and X-ray diffraction (XRD). The nanomechanical properties, film–substrate adhesion, and tribological properties of the films were evaluated using a nanoindenter, a scratch tester, and a friction and wear tester, respectively. XRD analysis showed that the main distinguishable crystalline phase in all films was face-centered cubic TiN. Analysis of the TiN (111) peak broadening indicated that the apparent crystallite size of the D1–D4 samples gradually decreased from 17.91 to 15.89 nm, suggesting a certain degree of crystallite refinement. Among them, the D3 film with 10 modulation cycles exhibited a relatively more pronounced TiN (200) preferred orientation. SEM observations showed that the D3 film contained fewer coarse surface particles and obvious defects and exhibited a relatively continuous cross-section without apparent through-thickness defects. Mechanical testing showed that D3 had the highest film–substrate adhesion strength of 27.8 N, representing increases of approximately 58.0

To explore how surface textures affect the adhesion between the diamond film and YG8 cemented carbide, this study prepared micro-nano-diamond coatings via HFCVD on substrates with six textures: wavy, hexagonal, concentric circular, inscribed circular, grid, and zigzag. Raman, XRD, SEM, and AFM were used to characterize nucleation, morphology, crystalline quality, and roughness; the friction coefficient and wear rate were tested under dry sliding. The wavy texture performed best: at a methane concentration of 5

To improve the friction and wear properties of TiN films on Si 3 N 4 ceramic bearings, a single-layer TiN film, a single-layer TiN-Cu film, and four groups of TiN-Cu gradient films with a gradient time T ranging from 30 to 90 min were deposited on Si 3 N 4 ceramics using magnetron sputtering technology. The microstructure of the films was investigated using an X-ray diffractometer (XRD), a scanning electron microscope (SEM), and an X-ray energy dispersive spectrometer (EDS). The mechanical properties, friction, and wear properties of the films were tested using a nanoindenter, a scratch tester, and a friction and wear tester. The results indicate that under identical experimental conditions, TiN-Cu gradient films exhibit finer and more compact grains. The TiN grains in these films grow along the (111) direction, adopting a face-centered cubic structure. The overall performance of the TiN-Cu gradient film surpasses that of single-layer TiN and TiN-Cu films. At a gradient time of 50 min, the TiN-Cu gradient film achieves a maximum hardness of 27.6 GPa and an H 3 /E 2 value of 0.18 GPa. Its film-substrate adhesion is approximately 1.4 times greater than that of the single-layer film, reaching 34.7 N. The gradient film also demonstrates a significantly reduced friction coefficient and wear rate, with the lowest values recorded at 0.11 and 2.17 × 10 −6 mm 3 / (m·N), respectively, highlighting its superior friction and wear properties. Adjusting the gradient time during the preparation of the TiN-Cu gradient film effectively enhances its mechanical, friction, and wear properties, thereby broadening its application potential.

ObjectivesWith the development of science and technology, silicon nitride ceramics have excellent physical and chemical properties such as high strength, high hardness, high temperature resistance, corrosion resistance, and wear resistance. They can maintain good mechanical properties and chemical stability under harsh working conditions, and have been widely used in many fields. However, silicon nitride has great brittleness, low toughness, and poor plastic deformation ability, which makes it prone to cracking and brittle fracture under the action of stress. At the same time, the friction coefficient of silicon nitride ceramics, as wear-resistant devices, is high under dry friction conditions, and the loss caused by friction and wear will reduce its accuracy and affect the working stability of parts. The diamond film has the properties such as high hardness, low thermal expansion coefficient, low friction coefficient, and excellent chemical stability, making it an excellent anti-wear and wear-resistant film material. However, the two common single-layer diamond films have their own shortcomings. Therefore, diamond films with multilayer structures are designed and prepared on silicon nitride substrates to improve the tribological properties of silicon nitride ceramics. MethodsThe single-layer and alternate multilayer diamond films with different structures were designed and prepared on silicon nitride ceramic substrates by hot filament chemical vapor deposition (HFCVD) technique. The surface and the cross-section morphology, crystal quality, crystal orientation, surface roughness, and phase compositions of single and alternate multilayer diamond films were analyzed by scanning electron microscope, X-ray diffractometer, atomic force microscope, and Raman spectroscopy. Results(1) For alternating multilayer films, the surfaces exhibit clustered nano-diamonds. When the number of alternations is small, the interlayer thickness is thick, the thin film is clearly layered, the layers are tightly connected, the surface roughness is small, and the film quality is good. When the number of alternations is more, the interlayer thickness is thin, the film does not have obvious layering, the surface roughness is large, and the film quality is poor. The Raman spectra of the alternating multilayer structures are similar to those of the nano-diamond film, with a higher content of trans-polyacetylene and non-diamond phases in the film. (2) For alternating multilayer structured films, the friction coefficients are generally lower than those of single-layer diamond films. When the number of alternations is small, the surface roughness of the film is reduced by the nano-diamond layer on the surface, and the tightly connected micro/nano interlocking structures and the micro-diamond layer at the bottom enhance the cohesion and bonding force of the film. The friction process of the film is stable, the wear rate of the film is low, and there is less film detachment during the friction process. When the number of alternations is high, the quality of the film is poor, and during the friction process, the film falls off and breaks, and the debris enters the friction surface of the film. The friction coefficient fluctuates greatly, and the wear rate of the film is high. When the number of alternations is 4 and the number of film layers is 8, the film has the lowest average friction coefficient and wear rate, which are 0.016 and 1.04×10−7 mm3/(N·m), respectively. ConclusionsThe surface morphology of diamond films has a significant impact on their tribological properties. The sharp (111) edge of the micro diamond film surface generates a strong plowing effect when interacting with the grinding ball, making it easier for diamond abrasive particles and debris to enter the grinding surface, resulting in an increase in friction coefficient and wear rate. The nano-grain size on the surface of the nano-diamond film is relatively small and has no sharp edges, which reduces the friction coefficient of the film. However, its bonding ability with the substrate is poor, and the partial detachment of the film under the shear stress increases the wear rate. The friction coefficient and the wear rate of alternating multilayer structures are generally reduced compared to single-layer diamond films. The reason is that the nano-diamond layer on the surface of the alternating structure reduces the surface roughness of the film, enhances its toughness, and the columnar growth of micro-diamond grains at the bottom of the film enhances the bonding performance between the film and the substrate, making the film less prone to peeling during friction. The crystalline quality of alternating multilayer thin films with thin interlayer thickness is poor, and the film rupture and peeling are prone to occur during the friction process, thereby increasing the friction coefficient and the wear rate. A reasonable alternating multilayer structure design can significantly reduce the maximum friction coefficient, the average friction coefficient, and the wear rate of the film during the friction process, reduce the plowing effect between the film and the wear pair, and reduce the wear scar area, thus improving the wear resistance of the film.

To avoid the failure of silicon nitride (Si3N4) materials caused by cracks or excessive friction, diamond films with Micron/Submicron/Nanometer multilayer structures were successfully prepared on Si3N4 substrate by hot filament chemical vapor deposition (HFCVD). Subsequently, MoS2 films were deposited on the surface using RF magnetron sputtering technology to construct a multilayer diamond/MoS2 self-lubricating film structure. The effects of Ar flow rate, sputtering power, and substrate temperature on the growth behavior of composite self-lubricating films were studied. By optimizing the sputtering parameters, the mechanical and friction properties of the films were optimized. Raman spectroscopy (Raman), X-ray diffraction (XRD), scanning electron microscopy (SEM), and atomic force microscopy (AFM) were employed to characterize the structural quality, composition, surface morphology, and surface roughness of the material. At the same time, the tribological properties of the films were evaluated by friction and wear experiments. The experimental results indicate that a 40 sccm Ar flow, 250 W sputtering power, and a substrate temperature of 300 °C are the optimal combination of process parameters. The multilayer diamond/MoS2 self-lubricating film prepared under these conditions exhibits high crystallinity, low surface roughness, and good interfacial bonding ability, resulting in a high hardness (21.16 MPa), elastic modulus (176.33 MPa), low friction coefficient (0.042) and a low wear rate (1.931 ± 0.043 × 10− 6 mm3/N·m). Under a load of 15 N, the wear resistance remains stable after friction for 45 min, indicating a promising application prospect for wear-resistant, self-lubricating Si3N4 bearings. The performance control of multilayer diamond/MoS2 self-lubricating film on Si3N4 substrate has important theoretical significance and engineering application value.

This study proposes a novel nitrogen gradient regulation strategy to mitigate wear on silicon nitride ceramic bearings under dynamic loading or impact. Gradient TiN films are deposited on silicon nitride ceramics using magnetron sputtering, with nitrogen flow rates dynamically optimized and regulated between 15 and 25 sccm. The phase composition and microstructure of TiN films with varying nitrogen gradients were analyzed using X-ray diffraction (XRD) and scanning electron microscopy (SEM). Film-substrate adhesion, as well as friction and wear properties, were evaluated via scratch and friction tests. Under identical experimental conditions, the gradient thin film exhibits finer and denser grains compared to the single-layer thin film. The hardness of the gradient thin film shows a slight increase, while its film-substrate adhesion is approximately 1.5 times greater than that of the single-layer counterpart. Notably, the TiN gradient thin film with a nitrogen gradient of 0.8 sccm/5 min achieves the highest film-substrate adhesion, with an LC2 value of 26.45 N. The gradient TiN film exhibits a significantly reduced friction coefficient and wear rate compared to the silicon nitride substrate and single-layer TiN film. Specifically, the TiN gradient film with a nitrogen gradient of 0.8 sccm/5 min achieves the lowest friction coefficient of 0.09 and a wear rate of 2.29 × 10−6 mm3/ (m·N). The gradient structure design notably enhances bonding strength while reducing friction and wear rate. This strategy significantly improves the substrate material’s wear resistance.

Ceramic bearings may crack and wear at high speeds. To address this issue, this study prepared high-performance diamond films on ceramics, aiming to reduce wear and extend the bearing lifespan. By utilizing Hot Filament Chemical Vapor Deposition (HFCVD) technology and adjusting the substrate temperature and methane concentration, the content of the sp² phase in the diamond films was precisely controlled, leading to the fabrication of micron- and nanometer-scale diamond-graphite composite films (MCD/G and NCD/G). The tribological properties of these films were tested with silicon nitride ceramic balls under dry friction conditions. During the tests, loads of 15 N, 25 N, and 35 N were applied, respectively, with a friction distance of 10 millimeters, a test duration of 60 min, and a reciprocating frequency of 3 Hz. The friction coefficient varied with load changes and the transformation from sp³ to sp² on the diamond surface. As the load increased, MCD films exhibited scratches and grain shedding, while NCD films showed increasing wear and the formation of transfer films. MCD/G films, due to their high graphite content, exhibited low wear and friction. Conversely, NCD/G films displayed plastic deformation and ripple-like wear marks due to their low diamond purity. Notably, the wear rate of the diamond films decreased as the load increased. Compared to the uncoated substrate, the prepared films reduced wear by approximately 99.98% (MCD), 99.69% (NCD), 99.90% (MCD/G), and 99.86% (NCD/G).

Diamond films were applied onto zirconia substrates, to potentially enhance the wear resistance of zirconia bearings under harsh working conditions, such as vacuum and/or no lubrication. To mitigate the mismatch between the zirconia substrates and the diamond films, a tungsten-molybdenum alloy transition layer was first deposited on the zirconia substrate using magnetron sputtering technology (MS), followed by the deposition of a diamond film through hot filament chemical vapor deposition (HFCVD). Orthogonal experimental methods were employed to explore the influence of transition layer composition, substrate temperature, methane concentration, and substrate roughness on the wear resistance. The results indicated that diamond films prepared on a tungsten-molybdenum alloy transition layer with W:Mo = 1:1 exhibited the highest quality. Furthermore, the substrate temperature, methane concentration, and substrate roughness significantly affected the quality of the diamond films. Specifically, the lowest friction coefficient and wear rate were observed when the substrate temperature was set at 850 °C during HFCVD, methane concentration at 4.5

The surface texture technology can improve the film–substrate adhesion and material properties by optimizing the surface microstructure of diamond films on WC – Co substrate. Four types of surface textures are fabricated on WC – Co cemented carbide (YG8) substrates using fiber laser processing, and different structural diamond films are deposited on the laser textured and nontextured substrates using the hot filament chemical vapor deposition technique. The structural features and mechanical properties and tribological properties of the textured diamond films are studied. The results show that the wave‐shaped texture structure shows the best performance in all experiments. The wave‐shaped textured diamond film has excellent adhesion, with few cracks appearing in the nanoindentation test and no significant peeling. The bonding strength is significantly higher than that of other textures. Under the methane concentration (5%), the wave‐shaped textured diamond film has uniform particle distribution, dense surface structure, good wear resistance, and the lowest friction coefficient, indicating that the film has excellent self‐lubrication and is suitable for use under heavy loads and long‐term conditions for precision machining.

To avoid failures such as cracking or elongation of silicon nitride (Si3N4), it is possible to use erosion-resistant diamond films. Diamond has very high hardness, high thermal conductivity, and a low friction factor, and its coefficient of thermal expansion is very close to that of Si3N4, which provides good adhesion, low residual stresses, and significantly increases the service life when deposited on Si(3)N(4 )substrates. Single-layer diamond films were deposited on Si(3)N(4 )substrates using hot filament chemical vapor deposition (HFCVD). A single variable control method was used to investigate the effect of the carbon source concentration, chamber pressure, and substrate temperature on the nucleation and growth of diamond on Si3N4 and to investigate the optimal parameters for the growth of micro- and nanodiamond films. Each of the three factors is defined as three series, where methane was selected as the carbon source. Series A represents the variation in the methane concentration, series B represents the variation in the chamber pressure, and series C represents the variation in the substrate temperature. The diamond surface and cross-sectional morphology, coatingquality, and surface roughness of the diamonds in the as-deposited diamond films prepared with different parameters were characterized using Laser Raman Spectrometry (Raman), X-ray Diffraction (XRD), Scanning Electron Microscopy (SEM), and Atomic Force Microscopy (AFM). Indentation experiments were carried out using a Rockwell hardness tester to observe the cracks in the films and the area of delamination, in order to analyze the adhesion force between the diamond films deposited with different parameters and the substrates The results are summarized as follows: (1) The growth rate and surface roughness are mainly affected by the methane concentration: the growth rate increased from 0.84 mu m / h to 1.32 mu m / h when the methane concentration was increased from 1% to 7%, whereas the surface roughness (Ra) decreased from 53.4 nm to 23.5 nm. As the methane concentration increased, more carbon radicals were deposited in the films; however, secondary nucleation tended to occur and the non-diamond phase increased, resulting in a reduction in the surface roughness and film quality. Excessive methane concentration reduces the mechanical strength and hardness of the films themselves, decreasing the adhesion force with the substrate and increasing the delamination of the films when stressed by forces. (2) The chamber pressure affects the kinetic energy of the active material within the reaction chamber that reaches the substrate. As the pressure increased, the kinetic energy decreased, which is unfavorable for diamond nucleation and growth. Although the diamond content was highest in the films grown at 2 kPa, analysis of the other factors collectively showed that the adhesive force for the substrate and surface morphology of the films grown at 2 kPa were not as good as those of the diamond films deposited at 1 kPa. (3) The surface morphology and diamond phase composition of the films were significantly influenced by the substrate temperature. At 800 C-degrees, the surface of the coating could not form complete and continuous diamond crystals, many cavities appeared and no obvious diamond characteristic peaks appeared in the Raman spectra. Therefore, a temperature below 800( degrees)C is not suitable for the growth of diamond. When the temperature was increased from 850 C-degrees to 900 C-degrees, the nucleation density of the diamond surface and the quality increased. In addition, the content of the non-diamond phase was reduced, and the surface had a more stable (111) crystalline structure, which enables the growth of high-quality films and provides a stronger adhesion force to the substrate. (4) The optimum growth temperature and air pressure were 900 C-degrees and 1 kPa, respectively. The methane concentration in the reaction chamber was adjusted to control the diamond grain size and sp(2) carbon content, giving films with 1% microdiamond and 5% nanodiamond.The preparation parameters for diamond films with excellent properties on ceramic substrates were optimized using three-factor-coupled experiments

Single and gradient multilayered diamond coatings, deposited on silicon nitride (Si 3 N 4 ), were prepared by hot filament chemical vapour deposition. The tribological properties were evaluated in a wide temperature range (26 °C–300 °C), against Si 3 N 4 ceramic balls, as the friction counterpart. The results showed that with the increase of temperature from 26 °C to 300 °C, the wear rate of NCD (nanocrystalline diamond) and GCD (gradient diamond) coatings rapidly increases. When the temperature reaches 300 °C, obvious cracks and detachment appear on the surface of the NCD coatings. Due to the special interlayer, the wear rate of the GCD coatings is lower than that of the NCD coatings. In the range of 26 °C to 100 °C, GCD exhibits excellent wear resistance and low friction coefficient due to its special gradient structure. When the temperature increases to 200 °C, NCD films with smaller grain sizes exhibit higher wear rates. From the wear morphology, it can be seen that cracks are generated in the NCD film, and as the temperature increases, the cracks continue to expand until the film spalling. GCD shows relatively good wear resistance at high temperatures. This study found that gradient multilayered diamond coatings exhibited superior wear resistance at high temperatures, compared with single-layer coatings tested in identical conditions.

PurposePreparing CrAlN coatings on the surface of silicon nitride bearings can improve their service life in oil-free lubrication. This paper aims to match the optimal process parameters for preparing CrAlN coatings on silicon nitride surfaces, and reveal the microscopic mechanism of process parameter influence on coating wear resistance.Design/methodology/approachThis study used molecular dynamics to analyze how process parameters affected the nucleation density, micromorphology, densification and internal stress of CrAlN coatings. An orthogonal test method was used to examine how deposition time, substrate temperature, nitrogen-argon flow rate and sputtering power impacted the wear resistance of CrAlN coatings under dry friction conditions.FindingsNucleation density, micromorphology, densification and internal stress have a significant influence on the surface morphology and wear resistance of CrAlN coatings. The process parameters for better wear resistance of the CrAlN coatings were at a deposition time of 120 min, a substrate temperature of 573 K, a nitrogen-argon flow rate of 1:1 and a sputtering power of 160 W.Originality/valueSimulation analysis and experimental results of this paper can provide data to assist in setting process parameters for applying CrAlN coatings to silicon nitride bearings.

The wear of disc cutters significantly impacts the efficiency and cost of TBM operations. In this study, we established a calculation model for radial wear based on the CSM formula and abrasive wear mechanisms. Experimental validation of the wear mechanism confirmed that abrasive wear is the primary mechanism responsible for disc cutter wear. The predictive model was subjected to engineering validation, where the calculated values from the model were compared and analyzed against actual on-site measurements. This validation process confirmed the accuracy and applicability of the model.

Monolayer and multilayer diamond films are deposited on WC‐Co cemented carbide by hot‐filament chemical vapor deposition. The growth characteristics of diamond coatings are analyzed. Cutting performance characteristics such as tool life and the stability of machining process in the machining of presintered ZrO 2 are compared based on the variation of cutting speed and resultant cutting force, and workpiece surface roughness. For the monolayer diamond coatings, as the concentration of CH 4 increases from 1% to 5%, the diamond crystal is transformed from micron columnar crystal to nanocluster crystal. The multilayer diamond coatings combine the advantages of micron‐ and nanocrystalline structures. The multilayer diamond‐coated tool exhibits longer service life and better machining quality. Because of the appearance of the brittle–plastic conversion mechanism, the surface integrity of ZrO 2 processed by multilayer diamond‐coated tool is relatively high. As for the uncoated tool, the workpiece is mainly machined by brittle spalling. The interfacial stratified fracture system between the interlayers is proposed to be the toughening mechanism of the multilayer structure.

氮化铝由于其优异的绝缘性和高硬度,被广泛用于绝缘涂层,有关氮化铝涂层的摩擦磨损研究较少,磨损去除机理尚不明确.本文基于ABAQUS有限元软件,采用Archard磨损模型和JH-2 陶瓷损伤模型搭建了氮化铝涂层磨损模型,对氮化铝材料的磨损机理进行了研究.结果表明载荷与滑行距离是影响磨损的主要因素,氮化铝材料的磨损量随两者的增加而增加.根据材料的应力曲线变化将其分为完全破碎型、部分破碎型和弹性变形型,结合实验数据与三种类型材料的应力分析共同揭示了氮化铝材料的磨损机理.

Diamond films were prepared by hot wire chemical vapour deposition on silicon nitride substrates with different surface roughness, and their properties were examined and analysed. The surface morphology of the crystallised silicon nitride substrates and the prepared diamond films were examined using field emission electron scanning microscopy and atomic force microscopy. The friction coefficient and wear rate of the diamond films were tested under dry friction conditions using a multi-functional friction and wear tester and a probe profiler. The effect of substrate roughness on the quality of the implant, the surface morphology of the diamond film, and the friction wear test results were combined to determine the effect of the surface roughness of the silicon nitride substrate on the wear resistance of the diamond film. The results show that the surface roughness of the substrate affects the uniformity and denseness of the implant, which in turn affects the growth of diamond particles on the surface of the substrate. The surface morphology of the substrate is also reflected on the surface of the diamond film. The substrates with surface roughness of 0.15 μm and 0.20 μm have good wear resistance, with the lowest wear rate of 1.75x10−7 mm3/mN and the lowest coefficient of friction of 0.078.

HFCVD method was used to prepare and characterize single and gradient multi-layered diamond coatings on tungsten carbide. The wear behaviour was evaluated in ambient air, against Si3N4 ceramic balls. The results demonstrated that with the increase of carbon-source concentration from 1% to 5%, the diamond surface grains gradually refined and formed crystal clusters, and the roughness (Ra) of diamond surface decreased from 62.3 to 32.54 nm. Concerning the 100, 300, and 600 nm gradient of multilayer diamond coatings, the roughness Ra was 31.3, 35.6, and 40.5 nm, respectively. The diamond film obtained with 1% CH4 concentration exhibited poor wear resistance. For higher CH4 concentration, the abrasion resistance increased gradually. The average friction coefficient of multilayer diamond coatings decreased from 0.052 to 0.023 as the modulated layer thickness increased from 100 to 600 nm. The gradient multilayer structure significantly improved the tribological behaviour.

Micro-diamond film, nano-diamond film and diamond-graphite composite film were deposited on silicon carbide substrate by hot filament chemical vapor deposition. The surface morphology and phase of the grown diamond films were analyzed using scanning electron microscope, atomic force microscope and Raman spectrometer. The friction coefficient and the wear rate of diamond films were measured by friction experiments. The friction and wear properties of diamond films were studied by comparing the experimental results. The results show that the diamond-graphite composite film has better friction and wear properties, the surface roughness of which is 53.8 nm. The friction coefficient (0.040) is similar to that of the nano-diamond film (0.037), while the wear rate is the lowest, 2.07×10−7 mm3·N−1·m−1. Compared with those of SiC substrate, the wear rate (9.89×10−5 mm3·N−1·m−1) and the friction coefficient (0.580) of the diamond films have been greatly improved, which indicates that depositing diamond on the surface of SiC substrate significantly improves the performance of the silicon carbide in the field of friction.

The influence of some key parameters of hot filament chemical vapor deposition (HFCVD) on the temperature distribution during the deposition of diamond coatings on silicon nitride (Si 3 N 4 ) substrates was assessed with the help of the finite element method. Solid heat transfer, fluid heat transfer and surface radiation heat transfer mechanisms were used to calculate the substrate temperature in the steady state during the deposition process. The accuracy of the model was verified by comparing the simulation model with experimental measurements. The comparison shows that the deviation between the model and the actual substrate temperature measurements is within 3%. Furthermore, a Taguchi orthogonal experiment was designed (3 factors, 3 levels, L9). By changing the number of hot filaments, the distance between the filaments and the substrate, and the separation between two adjacent hot filaments, the influence trend of these parameters on the substrate temperature was assessed, leading to an optimal hot filament arrangement. A deposition experiment was carried out using the optimized parameters, and the results showed that the substrate surface temperature obtained by numerical simulation is highly consistent with the temperature measured by the infrared thermometer. The optimized deposition parameters contributed to a more suitable temperature range and more uniform temperature distribution on the Si 3 N 4 ceramic substrate. The deposited diamond film exhibited uniform crystal quality and grain morphology, thus verifying the validity of the simulation results.