Metal-oxide-semiconductor capacitors with 15 nm of silicon oxide deposited by ion beam sputtering on Si substrates were analyzed using current–voltage and capacitance–voltage measurements. A large Fowler–Nordheim conduction zone between a threshold field of 5 MV·cm−1 and a breakdown field of 12.5 MV·cm−1 was established. Hysteresis measurements led to conclude that a few amount of charge is stored in the bulk of the dielectric. Interface trap density was found to be very close to that of thermally grown Si oxide with a midgap value of 3.3 × 1010 cm−2·eV−1. Fowler–Nordheim injections using a constant current density were used to study the build-up of trapped charge in the bulk oxide. Hence, the normalized centroid of the trapped charge distribution has been located close to the metal electrode. Only one trap was extracted from the simulation of experimental data with a saturated trap density among the lowest reported for Si/SiO2 systems of NT = 1.85 × 1012 cm−2 and a capture cross section σ = 2.9 × 10−16 cm2. We demonstrated that a thin and reliable gate oxide with a high electrical quality can be achieved on Si by ion beam sputtering deposition at room temperature. Such an oxide takes its place in technologies where a low thermal budget is required e.g. system-on-panel technology.
Two-dimensional (2D) semiconductors possess the potential to ultimately minimize the size of devices and concomitantly drastically reduce the corresponding energy consumption. In addition, materials in their atomic-scale limit often possess properties different from their bulk counterparts paving the way to conceptually novel devices. While graphene and 2D transition-metal dichalcogenides remain the most studied materials, significant interest also exists in the fabrication of atomically thin structures from traditionally 3D semiconductors such as GaN. While in the monolayer limit GaN possesses a graphenelike structure and an indirect band gap, it was recently demonstrated that few-layer GaN acquires a Haeckelite structure in the direction of growth with an effectively direct gap. In this work, we demonstrate the possibility of strain engineering of the atomic and electronic structure of few-monolayer-thick GaN structures, which opens new avenues for their practical application in flexible nanoelectronics and nano-optoelectronics. Our simulations further suggest that due to the weak van der Waals-like interaction between a substrate and an overlayer, the use of a MoS2 substrate may be a promising route to fabricate few-monolayer Haeckelite GaN experimentally.
Using N K-edge XANES studies, we demonstrate a noticeable difference in local structure around the nitrogen atoms in as-deposited amorphous and annealed N-doped GeTe-based phase change alloys. The pronounced changes appear as a approximate to 2 eV shift in the absorption edge to higher photon energies and the overall shape of the XANES spectrum. Comparison of the experimental XANES spectrum of the as deposited amorphous phase with ab-initio XANES simulations discloses that the as-deposited phase mainly consists of the NGe3 and the NTe3 pyramidal units in approximately equal concentration. When annealed, NTe3 units gradually rebond to the NGe3 units and at the same time N atoms diffuse through the amorphous phase to form the GexNy aggregates. Upon long-standing annealing at 400 degrees C a compact interlayer of Ge3N4 is formed in the crystalline phase. (C) 2017 Elsevier B.V. All rights reserved.
Two-dimensional (2D) semiconductors are a very hot topic in solid state science and technology. In addition to van der Waals solids that can be easily formed into 2D layers, it was argued that single layers of nominally 3D tetrahedrally bonded semiconductors, such as GaN or ZnO, also become flat in the monolayer limit; the planar structure was also proposed for few-layers of such materials. In this work, using first-principles calculations, we demonstrate that contrary to the existing consensus the graphitic structure of few-layer GaN is unstable and spontaneously reconstructs into a structure that remains hexagonal in plane but with covalent interlayer bonds that form alternating octagonal and square (8|4 Haeckelite) rings with pronounced in-plane anisotropy. Of special interest is the transformation of the band gap from indirect in planar GaN toward direct in the Haeckelite phase, making Haeckelite few-layer GaN an appealing material for flexible nano-optoelectronics.
300 series stainless steels are the most common materials used in the manufacture of container for the intermediate storage of low‐ and intermediate‐level radioactive wastes. Today, aluminium alloys are being considered as an alternative as they would enable gamma measurements to be performed directly through the container. However, reactions which occur during storage, lead to the formation of corrosive species. An investigation and comparison of the corrosion behaviour of a 5754 aluminium alloy container with that of a 304L stainless steel container was realised. Samples were introduced in corrosive environment during several months and then characterised by SEM. Results allow or not to validate the use of this aluminium alloy as nuclear container material.
Although ZnO has long been touted as an excellent material for UV light-emitting diodes and lasers, p-type doping still remains a challenge. In recent reports claiming that p-type doping can be achieved using nitrogen, arsenic and phosphorus, the spatial location of the dopants in the "successful" samples has not been identified. In this work, we present simulation results of x- ray absorption spectra for different locations of p-type dopants and argue that this technique is a powerful tool to experimentally investigate the location of group V dopants and to establish a correlation between the dopant location and corresponding conductivity type.
High-energy ball-milling is proven to be an effective technique for manufacturing reactive aluminum nanopowders. The procedure of milling presented in this work allows the elaboration of aluminum powders with specific surface areas around 20m2/g. The particles have platelet morphology and are constituted by a nanocrystalline aluminum core surrounded by a thick amorphous alumina layer of 4.5±0.5nm. The reactivity of the powders is enhanced as compared to nanopowders elaborated with techniques involving vapor phase condensation. The morphology, the microstructure and the initial thickness of the alumina layer are shown to be important parameters that influence the reactivity. The method could be extended to any other ductile metal, provided a hard surface layer is continuously formed during milling.
A simultaneous X-ray absorption spectroscopy and calorimetric experiment was performed on the binary Ge15Sb85 phase change material in order to obtain a deeper understanding of the two-step crystallization mechanism. The combination of these techniques allows monitoring the structural and thermal changes related to the crystallization process with a time resolution of the order of 1s. Both observed crystallization transitions go along with significant atomic rearrangements affecting not only the radial distribution function, but also the amplitude of thermal vibrations. From these data, the stoichiometry of the crystallized phases is also extracted.
In–Sb-based super-resolution near-field structure read-only-memory discs with radial density increased by introducing a narrow track pitch corresponding to the diffraction limit of an optical system were developed. Using an optical system with a laser diode with a wavelength of 405 nm and an objective lens with a numerical aperture of 0.85, we confirmed that differential phase detection (DPD) could detect track errors from disc samples recorded random data including a minimum pit length of 75 nm in a 240 nm track period. It has higher capability of track error detection than push–pull detection at a narrowed track pitch. Moreover, bit error rates satisfying the criterion of 3.0×10-4 were experimentally obtained for 66.7-GB-capacity disc samples with a 240 nm track pitch through signal processing with the partial response maximum likelihood of the (1,2,2,1)-type, by applying DPD to tracking servo control. The feasibility of increasing the track density of the Blu-ray DiscTM physical format by 1.33 times was indicated.
The local structure around nitrogen species in N-doped GeTe has been investigated using (soft) x-ray absorption spectroscopy and high-resolution x-ray photoemission spectroscopy. The obtained results demonstrate that while in as-deposited amorphous GeTe nitrogen is predominantly bonded to Ge atoms, upon crystallization the majority of nitrogen forms N2 molecules that are likely to be located in the grain boundaries, with only a small fraction of nitrogen species remaining bonded to Ge.
The electroluminescent properties of InGaN/GaN nanowire-based light emitting diodes (LEDs) are studied at different resolution scales. Axial one-dimensional heterostructures were grown by plasma-assisted molecular beam epitaxy (PAMBE) directly on a silicon (111) substrate and consist of the following sequentially deposited layers: n-type GaN, three undoped InGaN/GaN quantum wells, p-type AlGaN electron blocking layer and p-type GaN. From the macroscopic point of view, the devices emit light in the green spectral range (around 550 nm) under electrical injection. At 100 mA DC current, a 1 mm2 chip that integrates around 10(7) nanowires emits an output power on the order of 10 µW. However, the emission of the nanowire-based LED shows a spotty and polychromatic emission. By using a confocal microscope, we have been able to improve the spatial resolution of the optical characterizations down to the submicrometre scale that can be assessed to a single nanowire. Detailed μ-electroluminescent characterization (emission wavelength and output power) over a representative number of single nanowires provides new insights into the vertically integrated nanowire-based LED operation. By combining both μ-electroluminescent and μ-photoluminescent excitation, we have experimentally shown that electrical injection failure is the major source of losses in these nanowire-based LEDs.
Carbon films with up to 32 at. % of nitrogen have been prepared with ion beam assisted magnetron, using a N2+/N+ beam at energies between 50 and 300 eV. The composition and density of the films vary strongly with the deposition parameters. EELS, SXS, XPS, and IR studies show that these a-C: N films are mostly graphitic and have up to 20% sp3 bonding. Nitrogen is mostly combined with carbon in nitrile (C ≡ N) and imine (C=N) groups. It is shown by RBS and NDP that density goes through a maximum as the average damage energy per incoming ion increases. Positron annihilation spectroscopy shows that the void concentration in the films goes through a minimum with average damage energy. These results are consistent with a densification induced by the collisions at low average damage energy values and induced graphitization at higher damage energy values. These results are similar to what is observed for Ar ion assisted deposition of a-C films. The mechanical properties of these films have been studied with a nanoindenter, and it was found that the hardness and Young's modulus go through a maximum as the average damage energy is increased. The maximum of mechanical properties corresponds to the minimum in the void concentration in the film. Tribological studies of the a-C: N show that the friction coefficient obtained against diamond under dynamic loading decreases strongly as the nitrogen composition increases, this effect being more pronounced at low loads.
Effect of nitrogen and carbon doping on the structure of GeTe has been investigated using x-ray diffraction and extended x-ray absorption fine structure (EXAFS) spectroscopies. While Bragg diffraction which probes the global structure exhibits a clear transition upon doping from the rhombohedral phase to the cubic (rocksalt) phase, the local structure probed by EXAFS remains rhombohedrally distorted across the compositions studied. The apparent inconsistency between the results of the two techniques used is attributed to disordering upon doping and the resulting order-disorder transition that is “seen” by site-averaging diffraction as a displacive rhombohedral-to-cubic transition.
In situ transmission electron microscopy (TEM) observations were performed for a better understanding of the “melt quenched” GeTe crystallization mechanism. The evolution of the crystallite morphology observed during annealing shows a growth-dominated crystallization behavior. Scanning transmission electron microscopy—electron dispersive x-ray spectroscopy and high resolution electron microscopy experiments were also performed on cycled GeTe devices, showing that void formation is responsible for the cell failure after 107 cycles.
A report is presented on the fabrication of light emitting diodes (LEDs) based on GaN core/shell wires on conductive substrates by metal organic vapour phase epitaxy. Catalyst-free GaN-based wires are grown spontaneously on 2-inch n-doped silicon substrates without any thick buffer layer. The LED wire heterostructure consists of an n-type GaN: Si core covered radially by five InGaN/GaN quantum wells and a p-type GaN:Mg shell. Macroscopic devices that integrate around 10(6) wire-LEDs have been obtained thanks to a simple, direct and full-wafer scale contacting process. For the first time, continuous-wave electrical injection at room temperature through the Si substrate into a cm(2)-chip of GaN-based core/shell wire-LEDs is successfully demonstrated, producing blue electroluminescent emission at 450 nm.
A super-resolution near-field structure (super-RENS) read-only-memory disc with an In–Sb thin film as a super-resolution active layer corresponding to a 50 Gbyte capacity per layer was fabricated. The carrier-to-noise ratio at a pit length of 75 nm exceeded 40 dB and a bit error rate (bER) of the order of 10 -5 satisfying the 3.0×10 -4 criterion was obtained. To the best of our knowledge, this is the first report on the successful and seamless playback performance of a high-definition video content from the super-RENS disc at a data transfer rate of either 36 or 72 Mbps. The bER results of fixed and adaptive partial response maximum likelihood detections are described.
Results of x-ray absorption studies of the structure of amorphous InSb are reported. We demonstrate that approximately 1% bond elongation in the amorphous phase (as compared to the crystalline phase) is accompanied by a counterintuitive increase (approximately 5%) in density. We argue that this controversy is due to the formation of wrong bonds in the amorphous phase with both Sb and In atoms effectively preserving their tetrahedral coordination. Our results additionally offer an alternative interpretation of the semiconductor-metal transition observed upon melting of InSb.
We studied and improved gallium nitride (GaN) nanowire (NW) based light emitting diodes (LEDs). PIN nanodiodes with and without InGaN/GaN multiple quantum wells (MQWs) were grown by molecular beam epitaxy (MBE) under N-rich conditions on n-doped Si(111) substrates. Thanks to the coalescence of the p-type region of the NWs grown at low temperature, an autoplanarization process has been performed to obtain LEDs. Ni/Au top contacts have been deposited and patterned in order to bias the devices. A multiple-scale characterization approach has been carried out through the comparison of localized cathodoluminescence (CL) and macroscopic electroluminescence (EL) spectra. It shows that the EL emission of PIN-based LED at room temperature is related to defects in the p-type region of the NWs. In order to enhance the radiative recombinations of NW-based LEDs, we have first added InGaN/GaN MQWs, and secondly an electron blocking layer (EBL) has been inserted between the MQWs and the p-type zone of the NWs. The LED with EBL exhibited an emission band at 420 nm. The blue-shift of this emission band with increasing injected current is attributed to quantum confined Stark effect (QCSE) and evidences the radiative emission of InGaN/GaN MQWs. At 50 mA dc current, this improved NW-based LED emits about 500 times more light than the heterostructure without EBL. (C) 2010 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
Kenta Nakai合作论文数Laboratory of Functional Analysis in silico
Human Genome Center
The Institute of Medical Science
The University of Tokyo4