Pb(Zr, Ti)O 3 (PZT) heterostructure optical waveguides were grown on low resistivity Nb-doped SrTiO3(100) substrates by solid-phase epitaxy. The propagation loss was reduced to 1.7 dB/cm at the wavelength of 1.3 μm by introducing an epitaxial buffer layer between the PZT waveguide and the Nb-doped SrTiO3 substrate. An electro-optic beam deflector with an indium–tin–oxide prism electrode on the surface of the PZT waveguide showed efficient laser beam deflection as great as 3.3° (58 mrad) by applying 20 V between the prism electrode and the substrate. An index change higher than 0.001 at 5 V and an average apparent electro-optic coefficient larger than 46 pm/V were estimated from the deflection characteristic.

The patterning process of (Pb, La)(Zr, Ti)O3 heterostructure waveguides was examined for fabricating micro-optics, including channels and lenses. After the patterning of the amorphous thin films derived from spin-cast methoxyethoxide precursors by a wet etching, the patterned amorphous film was crystallized by solid-phase epitaxy. A 5-μm-wide ridge-type channel waveguide was fabricated in a Pb0.91La0.09(Zr0.65Ti0.35)O3/Pb(Zr0.52Ti0.48)O3 heterostructure on a SrTiO3 (100) substrate by the process. The optical confinement was successfully observed. A mode index lens was also fabricated in the Pb0.91La0.09(Zr0.65Ti0.35)O3/Pb(Zr0.30Ti0.70)O3 heterostructure on the SrTiO3 (100) substrate. A deflection of the collimated light by the lens was observed.

The electrooptic behavior of (Pb, La)(Zr, Ti)O3 (PLZT) heterostructure waveguides, including PLZT/Pb(Zr0.95Ti0.05)O3 [PZT (95/5)] and Pb(Zr0.52Ti0.48)O3 [PZT (52/48)]/Pb(Zr0.85Ti0.15)O3 [PZT (85/15)] on Nb–ST substrates was examined. Electrooptic behavior was characterized by fabricating beam deflectors using these heterostructures. The heterostructure waveguides exhibited hysteresis-free electrooptic behavior after the application of initial voltage. The electrooptic behavior of PLZT/PZT (95/5) and PZT (52/48)/PZT (85/15) heterostructure waveguides presented a nonlinear dependence and a linear dependence, respectively. The apparent electrooptic coefficient of the PLZT/PZT (95/5) heterostructure obtained from the linear part of the V–θ characteristic above +7.5 V was 53 pm/V, and that of the PZT (52/48)/PZT (85/15) heterostructure was 37 pm/V. The electrooptic coefficient of the PZT (52/48) waveguide layer using an effective voltage was estimated to be 53 pm/V.

Pb(Zr,Ti)O 3 (PZT) thin-film optical waveguides were grown on Nb-doped SrTiO3 substrates by solid-phase epitaxy to fabricate an electrode/waveguide/conductor structure. The propagation loss was relatively large for a PZT waveguide on a lightly Nb-doped SrTiO3 as compared with the propagation loss of 4 dB/cm for the structure using undoped SrTiO3. An electro-optic beam deflection device was fabricated by preparing a prism electrode on the surface of the PZT waveguide on a lightly Nb-doped SrTiO3 substrate. Efficient deflection of the coupled laser beam in the PZT waveguide as large as 11 mrad was observed by applying 35 V between the prism electrode and the substrate.

High quality epitaxial PZT optical waveguides have been grown by solid-phase epitaxy based on metal alkoxide solution process. Optical propagation loss was 4 dB/cm in epitaxial PZT thin film optical waveguides grown on SrTiO 3 substrates. Epitaxial PZT optical waveguides were grown on Nb doped conductive SrTiO 3 substrates, since considerable reduction in drive voltage will be expected when top electrode / optical waveguide / conductive substrate structures are realized. Propagation loss was relatively large, as compared with the structure using non-dope insulative substrates. Preliminary electrooptic deflection devices were fabricated by preparing prism electrodes on the surface of the PZT optical waveguides. Efficient deflection/switching of coupled laser beam in the PZT optical waveguides as large as 26 mrad was observed by applying 70 volts between prism electrode and Nb doped SrTiO 3 substrates.

Control of crystallinity in solid phase epitaxial growth of LiNbO3 thin films derived from methoxyethoxide solution on sapphire substrates has been attempted by investigating growth variables. Crystallization at 700° C for longer than 30 min was necessary for full crystallization of LiNbO3 thin films, although the orientations of the LiNbO3 crystal planes parallel to the substrates were almost independent of crystallization temperature and crystallization time. Layer-by-layer crystallization and preparation of an ultrathin initial layer have been found to be important in the growth of high-quality epitaxial LiNbO3 thin films. X-ray diffraction analysis revealed that perfectly single-plane-oriented epitaxial LiNbO3 thin films, with rocking curve full width at half-maximum of less than 0.07°, were produced on sapphire (001) substrates. Refractive index of 2.24 and optical propagation loss of 3.0 dB/cm were achieved.