We report on the fabrication of a laminar multilayer amplitude grating, characterization in the soft x-ray region, and modeling of its properties. Holographic lithography was used to produce a 0.24-μm spatial period grating on a triode sputtered Mo/C multilayer mirror. The pattern was transferred into the multilayer mirror by reactive ion etching in an SF6 plasma after an intermediate lift-off step. The position and relative efficiency of the different orders of a grating etched down to the silicon substrate were measured at the Cu Lαβ line (1.33 nm). The results were interpreted in the framework of a scalar kinematic diffraction theory.

The performance of a lamellar multilayer amplitude grating with a 0.24 μm pitch produced using holography and reactive ion etching is assessed in the 1 keV region with synchrotron radiation. The position and efficiency of the various orders of grating diffraction are compared to values calculated within the framework of kinematical or dynamical models. The unique properties of these optical devices are discussed.

Mo/C laminar multilayer amplitude gratings for use in the 1 keV or 250 eV region were fabricated by holography or electron beam lithography followed by reactive ion etching. The gratings were tested with monochromatized synchrotron radiation and their performance was compared to theoretical values.

Two laminar amplitude multilayer gratings with 250-nm pitch were produced using UV holography and reactive ion etching. The diffraction properties of these structures were measured at 150 eV using synchrotron radiation. The experimental results, giving the position and absolute reflectivity of the various orders, are discussed within a kinematical model.

Multilayer mirror gratings and Fresnel zone plates were produced using a multistep process utilizing microfabrication techniques. The gratings were generated by holography and the zone plates by electron beam lithography on Mo/C multilayer mirrors. The pattern transfer was performed by reactive ion etching in a fluorinated plasma after an intermediate lift-off step. Gratings with pitches down to 0.24 µm as well as linear, circular (with 0.3 µm outer zone), and elliptical Fresnel zone plates (with 0.8µm outer zones) were produced.

New x-ray optics based on multidimensional diffraction are now available and have specific properties and potentials. Some characteristics of multilayer laminar amplitude gratings are presented in this work and exemplified with Mo/C multilayer etched gratings (1000 lines/mm) and (4166 lines/mm) for use in the 250 eV region and the 1 keV, respectively. The fabrication, tests of the gratings, and modeling of their diffractive performances are reported. Possible applications are discussed.

We report on the fabrication of a multilayer linear grating, characterization in the soft x-ray region and modeling of its perfonnance. Holographic lithography was used to produce a 0.24 p.m spatial period grating on a triode sputtered Mo/C multilayer mirror. The pattern was transferred into the multilayer mirror by reactive ion etching in an SF6 plasma after an intermediate lift-off step. The position and relative efficiency of the different orders of a grating etched down to the silicon substrate were measured at the Cu Lcz line (1.33 nm). The results were compared to the values calculated within the framework of a scalar kinematic diffraction theory of relief gratings.

Soft-x-ray multilayer gratings with a subhalfmicron period (360 nm) are produced using uv holography and reactive ion etching. The multilayers are fabricated by a triode sputtering technique. The diffraction patterns of these new optical devices are measured at the Cu Lα, β wavelength (1.33 nm). The results are discussed within the framework of a scalar diffraction theory of relief gratings.

Holographic lithography was used to produce a 0.36 μm spatial period grating on top of a Mo/C layered synthetic microstructure. The pattern was transferred to the multilayer mirror by reactive ion etching. The performance of the device has been evaluated at the Cu.Lα,β3 wavelength ( 1.33 nm ). A simple theoretical model explains the main features of the diffraction efficiency of the soft X-ray highly dispersive multilayer mirror.