On December 5, 2022, an indirect drive fusion implosion on the National Ignition Facility (NIF) achieved a target gain G_{target} of 1.5. This is the first laboratory demonstration of exceeding "scientific breakeven" (or G_{target}>1) where 2.05 MJ of 351 nm laser light produced 3.1 MJ of total fusion yield, a result which significantly exceeds the Lawson criterion for fusion ignition as reported in a previous NIF implosion [H. Abu-Shawareb et al. (Indirect Drive ICF Collaboration), Phys. Rev. Lett. 129, 075001 (2022)PRLTAO0031-900710.1103/PhysRevLett.129.075001]. This achievement is the culmination of more than five decades of research and gives proof that laboratory fusion, based on fundamental physics principles, is possible. This Letter reports on the target, laser, design, and experimental advancements that led to this result.

For more than half a century, researchers around the world have been engaged in attempts to achieve fusion ignition as a proof of principle of various fusion concepts. As recently reported, a burning plasma state, where the alpha-heating in the plasma is the primary source of heating, was achieved in laboratory experiments. Following the Lawson criterion, an ignited plasma is one where the fusion heating power is high enough to overcome all the physical processes that cool the fusion plasma, creating a positive thermodynamic feedback loop with rapidly increasing temperature. In inertially confined fusion, ignition is a state where the fusion plasma can begin ``burn propagation'' into surrounding cold fuel, enabling the possibility of high energy gain. While ``scientific breakeven'' (i.e. unity target gain) has not yet been achieved, this talk reports the first controlled fusion experiment on the National Ignition Facility to produce capsule gain greater than unity (here 5.8) and reach ignition by many different formulations of the Lawson criterion. In the talk, we will discuss some key basic physics inertial confinement fusion (ICF) principles behind the burning plasma and ignition results as well as discuss future challenges.

A partial charge-based chemical polishing model has been developed, which can serve as metric for describing the relative polishing material removal rate for different combinations of slurries and workpieces. A series of controlled polishing experiments utilizing a variety of colloidal polishing slurries (SiO2, CeO2, ZrO2, MgO, Sb2O5) and optical materials [single crystals of Al2O3 (sapphire), SiC, Y3Al5O12 (YAG), CaF2, and LiB3O5 (LBO); a SiO2-Al2O3-P2O5-Li2O glass ceramic (Zerodur); and glasses of SiO2:TiO2 (ULE), SiO2 (fused silica), and P2O5-Al2O3-K2O-BaO (Phosphate)] was performed and its material removal rate was measured. As previously proposed by Cook (J Non-Cryst Solids. 1990;120:152), for many polishing systems, the removal rate is governed by a series of chemical reactions which include the formation of a surface hydroxide, followed by condensation of that hydroxyl moiety with the polishing particle, and a subsequent hydrolysis reaction. The rate of condensation can often be the rate limiting step, thus it can determine the polishing material removal rate. By largely keeping the numerous other factors that influence material removal rate fixed (such as due to particle size distributions, interface interactions, pad topography, kinematics, and applied pressure), the material removal rate is shown to scale exponentially with the partial charge difference ((wp-s)) between the workpiece and polishing slurry particle for many of the slurry-workpiece combinations indicating that condensation rate is the rate limiting step. The partial charge () describes the equilibrium distribution of electron density between chemically bonded atoms and is related to the electronegativity of the atoms chemically bonded to one another. This partial charge model also explains the age-old experimental finding of why cerium oxide is the most effective polishing slurry for chemical removal of many workpieces. Some of the slurry-workpiece combinations that did not follow the partial charge dependence offer insight to other removal mechanisms or rate limiting reaction pathways.

The primary sources of damage on the National Ignition Facility (NIF) Grating Debris Shield (GDS) are attributed to two independent types of laser-induced particulates. The first comes from the eruptions of bulk damage in a disposable debris shield downstream of the GDS. The second particle source comes from stray light focusing on absorbing glass armor at higher than expected fluences. We show that the composition of the particles is secondary to the energetics of their delivery, such that particles from either source are essentially benign if they arrive at the GDS with low temperatures and velocities.

A modeling method to extract the mechanical properties of ultra-thin films (10–100 nm thick) from experimental data generated by indentation of freestanding circular films using a spherical indenter is presented. The relationship between the mechanical properties of the film and experimental parameters including load, and deflection are discussed in the context of a constitutive material model, test variables, and analytical approaches. Elastic and plastic regimes are identified by comparison of finite element simulation and experimental data.

High energy laser systems are ultimately limited by laser-induced damage to their critical components. This is especially true of damage to critical fused silica optics, which grows rapidly upon exposure to additional laser pulses. Much progress has been made in eliminating damage precursors in as-processed fused silica optics (the advanced mitigation process, AMP3), and very high damage resistance has been demonstrated in laboratory studies. However, the full potential of these improvements has not yet been realized in actual laser systems. In this work, we explore the importance of additional damage sources-in particular, particle contamination-for fused silica optics fielded in a high-performance laser environment, the National Ignition Facility (NIF) laser system. We demonstrate that the most dangerous sources of particle contamination in a system-level environment are laser-driven particle sources. In the specific case of the NIF laser, we have identified the two important particle sources which account for nearly all the damage observed on AMP3 optics during full laser operation and present mitigations for these particle sources. Finally, with the elimination of these laser-driven particle sources, we demonstrate essentially damage free operation of AMP3 fused silica for ten large optics (a total of 12,000 cm2 of beam area) for shots from 8.6 J/cm2 to 9.5 J/cm2 of 351 nm light (3 ns Gaussian pulse shapes). Potentially many other pulsed high energy laser systems have similar particle sources, and given the insight provided by this study, their identification and elimination should be possible. The mitigations demonstrated here are currently being employed for all large UV silica optics on the National Ignition Facility.

The possibility of imploding small capsules to produce mini-fusion explosions was explored soon after the first thermonuclear explosions in the early 1950s. Various technologies have been pursued to achieve the focused power and energy required for laboratory-scale fusion. Each technology has its own challenges. For example, electron and ion beams can deliver the large amounts of energy but must contend with Coulomb repulsion forces that make focusing these beams a daunting challenge. The demonstration of the first laser in 1960 provided a new option. Energy from laser beams can be focused and deposited within a small volume; the challenge became whether a practical laser system can be constructed that delivers the power and energy required while meeting all other demands for achieving a high-density, symmetric implosion. The National Ignition Facility (NIF) is the laser designed and built to meet the challenges for study of high-energy-density physics and inertial confinement fusion (ICF) implosions. This paper describes the architecture, systems, and subsystems of NIF. It describes how they partner with each other to meet these new, complex demands and describes how laser science and technology were woven together to bring NIF into reality.

AbstractThe National Ignition Facility (NIF) laser with its 192 independent laser beams is not only the world’s largest laser but also the largest optical system ever built. With its 192 independent laser beams, the NIF requires a total of 7648 large-aperture (meter-sized) optics. One of the many challenges in designing and building NIF has been to carry out the research and development on optical materials, optics design, and optics manufacturing and metrology technologies needed to achieve NIF’s high output energies and precision beam quality. This paper describes the multiyear, multisupplier development effort that was undertaken to develop the advanced optical materials, coatings, fabrication technologies, and associated process improvements necessary to manufacture the wide range of NIF optics. The optics include neodymium-doped phosphate glass laser amplifiers; fused-silica lenses, windows, and phase plates; mirrors and polarizers with multilayer, high-reflectivity dielectric coatings deposited on BK7 substrates; and potassium di-hydrogen phosphate crystal optics for fast optical switches, frequency conversion, and polarization rotation. Also included is a discussion of optical specifications and custom metrology and quality-assurance tools designed, built, and fielded at supplier sites to verify compliance with the stringent NIF specifications. In addition, a brief description of the ongoing program to improve the operational lifetime (i.e., damage resistance) of optics exposed to high fluence in the 351-nm (3ω) is provided.

The nanomechanical deformations on glass surfaces near the elastic–plastic load boundary have been measured on various glasses by nanoscratching using an atomic force microscope ( AFM ) to mimic the mechanical interactions of polishing particles during optical polishing. Nanoscratches were created in air and aqueous environments using a 150‐nm radius diamond‐coated tip on polished fused silica, borosilicate, and phosphate glass surfaces; the topology of the nanoscratches were then characterized by AFM . Using load ranges expected on slurry particles during glass polishing (0.05–200 μN), plastic‐type scratches were observed with depths in the nm range. Nanoscratching in air generally showed deeper & narrower scratches with more pileup compared to nanoscratching in water, especially on fused silica glass. The critical load needed to observe plastic deformation was determined to range from 0.2–1.2 μN for the three glasses. For phosphate glass, the load dependence of the removal depth was consistent with that expected from Hertzian mechanics. However, for fused silica and borosilicate glass in this load range, the deformation depth showed a weak dependence with load. Using a sub‐ T g annealing technique, material relaxation was observed on the nanoscratches, suggesting that a significant fraction of the deformation was due to densification on fused silica and borosilicate glass. Repeated nanoscratching at the same location was utilized for determining the effective incremental plastic removal depth. The incremental removal depth decreased with increase in number of passes, stabilizing after ~10 passes. In water, the removal depths were determined as 0.3–0.55 nm/pass for fused silica, 0.85 nm/pass for borosilicate glass, and 2.4 nm/pass for phosphate glass. The combined nanoscratching results were utilized to define the composite removal function (i.e., removal depth) for a single polishing particle as a function of load, spanning the chemical to the plastic removal regimes. This removal function serves as an important set of parameters in understanding material removal during polishing and the resulting workpiece surface roughness.

It is a well-known challenge to determine refractive index (n) from ultra-thin films where the thicknessis less than about 10 nm [1,2]. We discovered an interesting exception to this issue while characterizingspectroscopic ellipsometry (SE) data from isotropic, free-standing polymer films. Ellipsometry analysisshows that both thickness and refractive index can be independently determined for free-standing filmsas thin as 5 nm. Simulations further confirm an orthogonal separation between thickness and index effectson the experimental SE data. Effects of angle of incidence and wavelength on the data and sensitivity arediscussed. While others have demonstrated methods to determine refractive index from ultra-thin films[ 3,4], our analysis provides the first results to demonstrate high-sensitivity to the refractive index fromultrathin layers. (C) 2016 Elsevier B.V. All rights reserved.

After every other failure mode has been considered, in the end, the high-performance limit of all lasers is set by optical damage. The demands of inertial confinement fusion (ICF) pushed lasers designed as ICF drivers into this limit from their very earliest days. The first ICF lasers were small, and their pulses were short. Their goal was to provide as much power to the target as possible. Typically, they faced damage due to high intensity on their optics. As requests for higher laser energy, longer pulse lengths, and better symmetry appeared, new kinds of damage also emerged, some of them anticipated and others unexpected. This paper will discuss the various types of damage to large optics that had to be considered, avoided to the extent possible, or otherwise managed as the National Ignition Facility (NIF) laser was designed, fabricated, and brought into operation. It has been possible for NIF to meet its requirements because of the experience gained in previous ICF systems and because NIF designers have continued to be able to avoid or manage new damage situations as they have appeared.

Many transition metal complexes exhibit infrared or visible optical absorption arising from d-d transitions that are the key to functionality in technological applications and biological processes. The observed spectral characteristics of the absorption spectra depend on several underlying physical parameters whose relative contributions are still not fully understood. Although conventional arguments based on ligand-field theory can be invoked to rationalize the peak absorption energy, they cannot describe the detailed features of the observed spectral profile such as the spectral width and shape, or unexpected correlations between the oscillator strength and absorption peak position. Here, we combine experimental observations with first-principles simulations to investigate origins of the absorption spectral profile in model systems of aqueous Cu(2+) ions with Cl(-), Br(-), NO2(-) and CH3CO2(-) ligands. The ligand identity and concentration, fine structure in the electronic d-orbitals of Cu(2+), complex geometry, and solvation environment are all found to play key roles in determining the spectral profile. Moreover, similar physiochemical origins of these factors lead to interesting and unexpected correlations in spectral features. The results provide important insights into the underlying mechanisms of the observed spectral features and offer a framework for advancing the ability of theoretical models to predict and interpret the behavior of such systems.

The chemical characteristics and the proposed formation mechanisms of the modified surface layer (called the Beilby layer) on polished fused silica glasses are described. Fused silica glass samples were polished using different slurries, polyurethane pads, and at different rotation rates. The concentration profiles of several key contaminants, such as Ce, K, and H, were measured in the near surface layer of the polished samples using Secondary Ion Mass Spectroscopy (SIMS). The penetration of K, originating from KOH used for pH control during polishing, decreased with increase in polishing material removal rate. In contrast, penetration of the Ce and H increased with increase in polishing removal rate. In addition, Ce penetration was largely independent of the other polishing parameters (e.g., particle size distribution and the properties of the polishing pad). The resulting K concentration depth profiles are described using a two‐step diffusion process: (1) steady‐state moving boundary diffusion (due to material removal during polishing) followed by (2) simple diffusion during ambient postpolishing storage. Using known alkali metal diffusion coefficients in fused silica glass, this diffusion model predicts concentration profiles that are consistent with the measured data at various polishing material removal rates. On the other hand, the observed Ce profiles are inconsistent with diffusion based transport. Rather we propose that Ce penetration is governed by the ratio of Ce–O–Si and Si–O–Si hydrolysis rates; where this ratio increases with interface temperature (which increases with polishing material removal rate) resulting in greater Ce penetration into the Beilby layer. Calculated Ce surface concentrations using this mechanism are in good agreement to the observed change in measured Ce surface concentrations with polishing material removal rate. These new insights into the chemistry of the Beilby layer, combined together with details of the single particle removal function during polishing, are used to develop a more detailed and quantitative picture of the polishing process and the formation of the Beilby layer.

Progress on understanding phenomena influencing surface figure and roughness during pad polishing are reviewed, followed by a description of a new Convergent Polishing process allowing single iteration, process variation-free finishing of optical flats & spheres.

The use of any optical material is limited at high fluences by laser-induced damage to optical surfaces. In many optical materials, the damage results from a series of sources which initiate at a large range of fluences and intensities. Much progress has been made recently eliminating silica surface damage due to fracture-related precursors at relatively low fluences (i.e., less than 10 J/cm(2), when damaged by 355 nm, 5 ns pulses). At higher fluence, most materials are limited by other classes of damage precursors which exhibit a strong threshold behavior and high areal density (>10(5) cm(-2)); we refer to these collectively as high fluence precursors. Here, we show that a variety of nominally transparent materials in trace quantities can act as surface damage precursors. We show that by minimizing the presence of precipitates during chemical processing, we can reduce damage density in silica at high fluence by more than 100 times while shifting the fluence onset of observable damage by about 7 J/cm(2). A better understanding of the complex chemistry and physics of cleaning, rinsing, and drying will likely lead to even further improvements in the damage performance of silica and potentially other optical materials.

Increases in the laser damage threshold of fused silica have been driven by the successive elimination of near-surface damage precursors such as polishing residue, fractures, and inorganic salts. In this work, we show that trace impurities in ultrapure water used to process fused silica optics may be responsible for the formation of carbonaceous deposits. We use surrogate materials to show that organic compounds precipitated onto fused silica surfaces form discrete damage precursors. Following a standard etching process, solvent-free oxidative decomposition using oxygen plasma or high-temperature thermal treatments in air reduced the total density of damage precursors to as low as <50 cm(-2). Finally, we show that inorganic compounds are more likely to cause damage when they are tightly adhered to a surface, which may explain why high-temperature thermal treatments have been historically unsuccessful at removing extrinsic damage precursors from fused silica.

Various ceria and colloidal silica polishing slurries were used to polish fused silica glass workpieces on a polyurethane pad. Characterization of the slurries’ particle size distribution (PSD) (using both ensemble light scattering and single particle counting techniques) and of the polished workpiece surface (using atomic force microscopy) was performed. The results show the final workpiece surface roughness is quantitatively correlated with the logarithmic slope of the distribution function for the largest particles at the exponential tail end of the PSD. Using the measured PSD, fraction of pad area making contact, and mechanical properties of the workpiece, slurry, and pad as input parameters, an Ensemble Hertzian Gap (EHG) polishing model was formulated to estimate each particle’s penetration, load, and contact zone. The model is based on multiple Hertzian contact of slurry particles at the workpiece–pad interface in which the effective interface gap is determined through an elastic load balance. Separately, ceria particle static contact and single pass sliding experiments were performed showing ~1-nm depth removal per pass (i.e., a plastic type removal). Also, nanoindentation measurements on fused silica were made to estimate the critical load at which plastic type removal starts to occur (Pcrit~5 3 10 � 5 N). Next the EHG model was extended to create simulated polished surfaces using the Monte Carlo method where each particle (with the calculated characteristics described above) slides and removes material from the silica surface in random directions. The polishing simulation utilized a constant depth removal mechanism (i.e., not scaling with particle size) of the elastic deformation zone cross section between the particle and silica surface, which was either 0.04 nm (for chemical removal) at low loads ( Pcrit). The simulated surfaces quantitatively compare well with the measured rms roughness, power spectra, surface texture, absolute thickness material removal rate, and load dependence of removal rate.

A method for chemically stabilizing metal oxide polishing slurries to prevent their agglomeration while maintaining their surface activity is demonstrated experimentally. Negatively charged ceria, zirconia, and alumina particles are reversibly size-stabilized under low ionic strength conditions at and above their isoelectric points using anionic surfactants.Stability is imparted only at surfactant concentrations above the critical micelle concentration and when the particle and the micelle have like-signed charges. Zeta potential measurements demonstrate that little adsorption of anionic surfactant occurs under conditions where the particles are negatively charged. Changes to pH, hydrophobicity, and ionic strength disrupt the surfactant's ability to size-stabilize the slurries. These results suggest that the charged micelles electrosterically hinder the agglomeration of oxide particles.Because the stabilization method does not rely on adsorption, the particle surface remains accessible for chemical reactions, such as those involved in polishing. Metal oxide slurries stabilized by this method remove material at a rate comparable to that of unstabilized slurry. In addition, stabilized slurry is easier to filter, which improves the quality of the polished surface. Stabilizing colloids by this method may prove valuable for systems where particle surface functionality is important, such as those used in ceramics processing, optical polishing, and chemical-mechanical planarization. (c) 2014 Elsevier B.V. All rights reserved.