It is now well established that multilayer coated gratings may offer high diffraction efficiencies over the tender X-ray range, from about 1 keV to 5 keV, covering the gap between single layer coated grating monochromators and crystal monochromators. Nevertheless, few beamlines in the world are using such gratings in their monochromator. The successful implementation of a multilayer grating monochromator requires producing a matched pair of a multilayer grating and a multilayer mirror, and this matching is not straightforward as it must account for different incidence angles and refraction effects on each element. Here we review the realization of the multilayer grating monochromator of the SIRIUS beamline which has been successfully in service for several years. We show how, by alternating computer simulation with our diffraction code and measurements, we could optimize the monochromator transmission on a very wide energy range. After the grating was coated, it was found that the angle of optimal efficiency versus photon energy was significantly different from what was predicted by a simple conformal model of binary layers. Layer interdiffusion and profile smoothing during the deposition process must be added to the multilayer model to reproduce the measured data. The critical adjustment of the mirror multilayer period is achieved by the lateral translation of the mirror, which was given a small transverse period gradient. The monochromator is thus providing high transmission efficiency in the 1 to 5 keV energy range, more than 30% over 2.5 keV and up to 46% at 4.6 keV.

This work determines a new set of EUV/x-ray optical constants for aluminum (Al), one of the most important materials in science and technology. Absolute photoabsorption (transmittance) measurements in the 17-1300 eV spectral range were performed on freestanding Al films protected by carbon (C) layers, to prevent oxidation. The dispersive portion of the refractive index was obtained via the Kramers-Kronig transformation. Our data provide significant improvements in accuracy compared to previously tabulated values and reveal fine structure in the Al L-1 and L-2,L-3 regions, with photon energy step sizes as small as 0.02 eV. The implications of this work in the successful realization of EUV/x-ray instruments and in the validation of atomic and molecular physics models are also discussed. (c) 2024 Author(s). All article content, except where otherwise noted, is licensed under a Creative Commons Attribution-NonCommercial-NoDerivs 4.0 International (CC BY-NC-ND) license (https://creativecommons.org/licenses/by-nc-nd/4.0/).

Precise knowledge of the wavelength-dependent refractive index of materials is required to accurately design, build and calibrate the in-band and out-of-band performance of EUV/x-ray instruments. Such instruments include exposure and patterning tools, imagers, microscopes and spectrometers for photolithography, plasma physics, synchrotron and laser science, solar physics and astrophysics. Yet, the available refractive index values in the EUV/x-ray are often unreliable. This is due to the extreme sensitivity of materials to contamination and oxidation, to the difficulty in fabricating appropriate thin film samples, to the presence of near-edge absorption fine structure, and to multiple reflections present at the longer EUV wavelengths, which are complicating the measurements. We are presenting a new methodology to measure the EUV refractive index and new sets of measurements for several important EUV materials. We use combinations of transmittance and reflectance data in the spectral range 826.5 eV (1.5 nm) to 15 eV (82.5 nm) and reveal for the first time highly resolved fine structure in the regions of L, M, N and O absorption edges, in both the absorptive and dispersive portions of the refractive index, resulting in improvements of up to a factor of 3 compared to earlier values. The improved refractive index accuracy is validated by sum rule tests and by simulating experimental data of multilayer coatings containing these materials.

We have developed a new method for the determination of photoabsorption at extreme ultraviolet wavelengths longer than 20 nm, where reliable refractive index values are sparse or non-existent. Our method overcomes the obstacle of multiple reflections that occur inside thin films in this spectral range, which up until now has prevented the accurate determination of photoabsorption from transmittance measurements. We have derived a mathematical expression that is independent of internal reflection amplitudes, while taking advantage of the transmittance oscillations stemming from such reflections. The method is validated on measurements of aluminum thin films. This advance will enable accurate refractive index values for many important materials for optical instrumentation, thus facilitating high-priority research on topics including coherent light sources, planetary and solar physics, and semiconductor manufacturing.

We have studied the laser pulse shape dependence of the conversion efficiency of λ = 1.03 μm laser pulse energy into 13.5 nm extreme ultraviolet (EUV) emission from a Sn laser-produced plasma. Laser pulses of arbitrary temporal shape ranging from hundreds of picoseconds to several nanoseconds were generated using a programmable pulse synthesizer based on a diode-pumped chirped pulse amplification Yb: YAG laser. Measurements show that the conversion efficiency favors the use of nearly square pulses of duration longer than 2 ns, in agreement with hydrodynamic/atomic physics simulations. A 35% increase in conversion efficiency was obtained when Q-switched pulses were substituted by square pulses of a similar duration. Experiments conducted irradiating a Sn target with a sequence of two time-delayed 250 ps pulses showed a 30 percent increase in the EUV yield respect to a single pulse of the same total energy when the pulse separation was optimum at 2.1 ns. This suggests that re-heating of the plasma with delayed laser pulses could be used to improve the EUV yield. The spectroscopic characterization of EUV emission and in-band EUV images that characterize the source size are also presented.

The Emirates Mars Mission (EMM) Hope probe was launched on 20 July 2020 at 01:58 GST (Gulf Standard Time) and entered orbit around Mars on 9 Feb 2021 at 19:42 GST. The high-altitude orbit (19,970 km periapse, 42,650 km apoapse altitude, 25° inclination) with a 54.5 hour period enables a unique, synoptic, and nearly-continuous monitor of the Mars global climate. The Emirates Mars Ultraviolet Spectrometer (EMUS), one of three remote sensing instruments carried by Hope, is an imaging ultraviolet spectrograph, designed to investigate how conditions throughout the Mars atmosphere affect rates of atmospheric escape, and how key constituents in the exosphere behave temporally and spatially. EMUS will target two broad regions of the Mars upper atmosphere: 1) the thermosphere (100–200 km altitude), observing UV dayglow emissions from hydrogen (102.6, 121.6 nm), oxygen (130.4, 135.6 nm), and carbon monoxide (140–170 nm) and 2) the exosphere (above 200 km altitude), observing bound and escaping hydrogen (121.6 nm) and oxygen (130.4 nm). EMUS achieves high sensitivity across a wavelength range of 100–170 nm in a single optical channel by employing “area-division” or “split” coatings of silicon carbide (SiC) and aluminum magnesium fluoride (Al+MgF2) on each of its two optical elements. The EMUS detector consists of an open-face (windowless) microchannel plate (MCP) stack with a cesium iodide (CsI) photocathode and a photon-counting, cross-delay line (XDL) anode that enables spectral-spatial imaging. A single spherical telescope mirror with a 150 mm focal length provides a 10.75° field of view along two science entrance slits, selectable with a rotational mechanism. The high and low resolution (HR, LR) slits have angular widths of 0.18° and 0.25° and spectral widths of 1.3 nm and 1.8 nm, respectively. The spectrograph uses a Rowland circle design, with a toroidally-figured diffraction grating with a laminar groove profile and a ruling density of 936 gr mm−1 providing a reciprocal linear dispersion of 2.65 nm mm−1. The total instrument mass is 22.3 kg, and the orbit-average power is less than 15 W.

Key insights in materials at extreme temperatures and pressures can be gained by accurate measurements that determine the electrical conductivity. Free-electron laser pulses can ionize and excite matter out of equilibrium on femtosecond time scales, modifying the electronic and ionic structures and enhancing electronic scattering properties. The transient evolution of the conductivity manifests the energy coupling from high temperature electrons to low temperature ions. Here we combine accelerator-based, high-brightness multi-cycle terahertz radiation with a single-shot electro-optic sampling technique to probe the evolution of DC electrical conductivity using terahertz transmission measurements on sub-picosecond time scales with a multi-undulator free electron laser. Our results allow the direct determination of the electron-electron and electron-ion scattering frequencies that are the major contributors of the electrical resistivity.

This manuscript presents the structural characterization of Al/Sc-based periodic multilayer coatings for the extreme ultraviolet (EUV) spectral range. Based on transmission electron microscopy and electron diffraction as well as grazing-incidence and large-angle x-ray diffraction, a model for the layer structure and the interfacial effects of Al/Sc coatings is built. The onset of crystallization in nanoscale Al and Sc layers as a function of thickness is also revealed in these characterizations. The Al/Sc layer model is validated and further refined by fitting in-band and out-of-band EUV reflectance measurements across 5 orders of magnitude in an extended wavelength range from 17 to 80 nm. The same type of EUV reflectance measurements is used to test the Al/Sc aging properties and to demonstrate the spectral response of optimized two- and tri-material multilayers including Al/Sc, Al/Sc/SiC and Mo/Al/Sc.

In this Letter, we have developed new and highly efficient periodic multilayer mirrors Al/Sc, Al/Sc/SiC, and Mo/Al/Sc with optimized reflectance at wavelengths between 40 and 65 nm. We have reached record values in measured peak reflectance: 57.5% at 44.7 nm and 46.5% at 51 nm, with Al/Sc/SiC at near-normal incidence. Furthermore, to the best of our knowledge, we have achieved the largest reported bandwidth with Mo/Al/Sc at 57 nm and the narrowest bandwidth with Al/Sc at a 60 nm wavelength. These new and promising results demonstrate that Al/Sc-based multilayer coatings are excellent candidates for future generations of extreme ultraviolet (EUV) instruments for solar physics, EUV lasers, and attosecond science, in a wavelength range that has not been fully explored.

This corrects the article DOI: 10.1103/PhysRevLett.120.265701.

HAL is a multi-disciplinary open access archive for the deposit and dissemination of scientific research documents, whether they are published or not. The documents may come from teaching and research institutions in France or abroad, or from public or private research centers. L’archive ouverte pluridisciplinaire HAL, est destinée au dépôt et à la diffusion de documents scientifiques de niveau recherche, publiés ou non, émanant des établissements d’enseignement et de recherche français ou étrangers, des laboratoires publics ou privés. A Special Section on X-ray and Extreme Ultraviolet Multilayer Coatings Franck Delmotte, Maria Pelizzo, Regina Soufli

This manuscript presents the first systematic study of non-periodic, broadband Mo/Si multilayer coatings with and without B 4C interface barrier layers for hard x-ray applications with large field of view. The photon energy of operation in this work is 17.4 keV, the Mo Kα emission line. The coatings involve layers with varying thicknesses in the nanometer scale and the behavior at the layer interfaces plays a crucial role in their performance. Reflectivity measurements and modeling at 8.05 keV and 17.4 keV, Transmission Electron Microscopy (TEM), as well as thin film stress measurements, are employed to examine and optimize the reflective performance of these coatings and the physics of their constituent layers and interfaces. Mo/Si with B 4C barrier layers on the Mo-on-Si interface is shown to produce the highest reflectivity among all design configurations considered in this work.

We present an experimental, self-consistent determination of the optical constants (refractive index) of Pt using a combination of photoabsorption and reflectance data in the photon energy range 25–778 eV, which includes the N- and O-shell electronic absorption edges of Pt. We compare our new experimental values with Pt optical constant data sets from the literature. Our Pt optical constant values reveal highly resolved absorption-edge fine structure around the O2,3 and N6,7 edges in both the absorptive and dispersive portions of the refractive index, which were missing in the earlier literature.

the coating, replication and characterization of a custom optic with peak response at 22.8 keV, using the custom-designed SANZ mandrels. Task2: carrying out modifications to the coating chamber at SAO to accommodate new, longer, custom-designed mandrels (SANZlong) that will be fabricated at NASA MSFC in FY2020. The longer mandrels are necessary to mitigate end effects observed in the replication process for the small optics currently being fabricated.

We present recent advances in the development of Chromium-based interference coatings in the EUV/soft x-ray range. We achieved breakthroughs in coating efficiency by using advanced concepts including 3-material multilayers and interface engineering.