Recent results from manufacturing multilayer La/B 4 C mirrors at wavelengths above 6.7 nm with carbon barrier layers are presented. It is shown that maximum reflection R = 58.6% is attained at λ = 6.661 nm.

The results from measuring reflection factors are presented for multilayer La/B 4 /C mirrors with barrier layers of carbon and scandium. It is shown that a higher reflection factor is obtained by depositing a layer of carbon onto a surface of boron carbide. This effect is caused by diminishing absorption in the structure and the reduced width of transition regions.

A comparison of the results of depth profiling of multilayer metal structures by secondary ion mass spectrometry with the use of various types of the registered secondary ions has been conducted. For the first time, it has been demonstrated that, to increase depth resolution, two variants can be used in addition to the known secondary ions CsM+ (M = La, Pd, Mo): M+ at sputtering by cesium ions and OM− at sputtering by oxygen ions. For the Mo/Si multilayer structures, the use of the elementary secondary ions Mo+ and Si+ at sputtering by Cs ions and probing by the cluster ions provides the best depth resolution.

The paper describes a new apparatus for the magnetron and ion-beam synthesis of multilayer structures. The process parameters and operating conditions are presented, and the expected effects are discussed.