In this work, synchrotron radiation rocking curve imaging (RCI) is used to visualize and characterize dislocations and second-phase defects in a highly perfect and absorbing CdTe(Zn) crystal. This technique requires recording a series of Bragg diffracted images along the rocking curve to produce maps of the `local' integrated intensity, full width at half-maximum and peak position. The diffraction conditions of the reported experiment are such that anomalous transmission (Borrmann effect) is a crucial ingredient for the formation of the image of the defects. The images recorded and maps produced allow the investigation of a series of topics that, to the authors' knowledge, have not been previously studied. The first of these topics is the variation of the position and width of the Borrmann image of a defect when sitting on the peak and on the flanks of the diffraction curve. The second topic is the way Borrmann images show up on the usual RCI maps. The final topic is the combination of Borrmann and weak-beam images to infer the depth of the defect within the crystal.

Cd1-yZnyTe single crystal is the current material of choice to be used as substrate for the growth of lattice-matched Hg1-x CdxTe epilayers with cutoffs wavelengths in the SWIR range (~2,9 μm (x=0,4) to 2μm (x=0,54)). For the manufacturing of large 2k² IR focal plane arrays with a 15 μm pitch, large diameter Cd1-yZnyTe ingots with a state-of-the-art material quality are required. Crystal growth method from the melt; like Vertical Gradient Freeze technique; enables us to get close to 5 inches in diameter, high quality single crystals, after decades of developments. As the growth of high-quality Cd1-yZnyTe single crystal ingots remains a big technological challenge, we present some recent technical achievements in this field, got within the frame of the H2020 ASTEROID project. Some requirements regarding material specification, like Cd1-yZnyTe substrate size, geometrical perfection (TTV, faces parallelism), material quality (crystallinity, dislocations) have imposed many new process updates and developments in our elaboration scheme. State-Of-the-Art 72x73 mm² Cd1-yZnyTe substrates with epiready surface preparations are now available for the Front-End-Of-Line of 2k² IR Focal Plane Array Processing at CEA-LETI / LYNRED (previously named SOFRADIR).

We report on Kelvin probe force microscopy (KPFM) and density functional theory (DFT) investigations of charge transfers in vertical heterojunctions between tungsten diselenide (WSe2) layers and graphene on silicon carbide substrates. The experimental data reveal the existence of an interface dipole, which is shown by DFT to originate from the neutralization of the graphene n-doping by an electron transfer towards the transition metal dichalcogenide (TMD) layer. The relative vacuum level shift probed by KPFM between the TMD and the substrate stays constant when passing from monolayer to bilayer graphene, which confirms that the Schottky-Mott model can be rigorously applied to these interfaces by taking into account the charge transfer from the substrate to the TMD. DFT calculations show that the first TMD layer absorbs almost all the excess charges contained in the graphene, and that the second TMD layer shall not play a significant role in the electrostatics of the system. Negatively charged defect at the TMD edges contribute however to the electrostatic landscape probed by KPFM on both TMD layers.

The Hall effect can be extended by inducing a temperature gradient in lieu of electric field that is known as the Nernst (-Ettingshausen) effect. The recently discovered spin Nernst effect in heavy metals continues to enrich the picture of Nernst effect-related phenomena. However, the collection would not be complete without mentioning the valley degree of freedom benchmarked by the valley Hall effect. Here we show the experimental evidence of its missing counterpart, the valley Nernst effect. Using millimeter-sized WSe _2 mono-multi-layers and the ferromagnetic resonance-spin pumping technique, we are able to apply a temperature gradient by off-centering the sample in the radio frequency cavity and address a single valley through spin-valley coupling. The combination of a temperature gradient and the valley polarization leads to the valley Nernst effect in WSe _2 that we detect electrically at room temperature. The valley Nernst coefficient is in good agreement with the predicted value.

The properties of group III-Nitrides (III-N) such as a large direct bandgap, high melting point, and high breakdown voltage make them very attractive for optoelectronic applications. However, conventional epitaxy on SiC and sapphire substrates results in strained and defective films with consequently poor device performance. In this work, by studying the nucleation of GaN on graphene/SiC by MOVPE, we unambiguously demonstrate the possibility of remote van der Waals epitaxy. By choosing the appropriate growth conditions, GaN crystals can grow either in-plane misoriented or fully epitaxial to the substrate. The adhesion forces across the GaN and graphene interface are very weak and the micron-scale nuclei can be easily moved around. The combined use of x-ray diffraction and transmission electron microscopy demonstrate the growth of stress-free and dislocation-free crystals. The high quality of the crystals was further confirmed by photoluminescence measurements. First principles calculations additionally highlighted the importance of the polarity of the underlying substrate. This work lays the first brick towards the synthesis of high quality III-N thin films grown via van der Waals epitaxy.

Hybrid systems based on the combination of crystalline bulk semiconductors with 2D crystals are identified as promising heterogeneous structures for new optoelectronic applications. The direct integration of III-V semiconductors on 2D materials is very attractive to make practical devices but the preservation of the intrinsic properties of the underlying 2D materials remains a challenge. In this work, we study the direct epitaxy of self-organized GaN crystals on graphene. We demonstrate that severe metal-organic chemical vapor deposition growth conditions of GaN (chemically aggressive precursors and high temperatures) are not detrimental to the structural quality and the charge carrier mobility of the graphene base plane. Graphene can therefore be used both as an efficient sensitive material and as a substrate for GaN epitaxy to make a self-assembled UV photodetector. A responsivity as high as 2 A W-1 is measured in the UV-A range without any further postprocessing compared to simple deposition of contact electrodes. Our study opens the way to build new self-assembled 2D/III-V hybrid optoelectronic devices by direct epitaxy.

Thermodynamic simulations of SiC hydrogen annealing illustrating the impossibility of graphene formation due to the high pressure of C–H gases.