LiNbO3 films were deposited by PLD from LiNbO3 crystalline or from three different stoichiometric or Li-enriched LiNbO3 targets. Polycrystalline films were prepared on SiO2/Si or sapphire substrates at temperatures T S ∼650–750 °C. Main attention was paid to the influence of targets preparation and the deposition conditions on films composition, morphology and crystallinity. The thin-film morphology was determined by SEM microscopy. The composition was measured by SIMS, RBS, PIXE and PIGE methods. Highly oriented, smooth and stoichiometric LiNbO3 films were synthesized.

Doped LiNbO3 films were prepared from Er- and Er, Yb-doped monocrystalline targets using laser ablation. SiO2/Si was used as a substrate. Polycrystalline films were synthesized at substrate temperatures of 650-800 degrees C. The influence of the deposition conditions on the film crystallinity, surface morphology, dopant concentration, optical properties (using the m-line technique and spectroscopic ellipsometry), and luminescence was studied. The films were luminescent at 1530 nm and were waveguiding.

We report on an extensive study of the deposition of titanium dioxide layers by pulsed laser deposition at either room temperature or at 200 degrees C (300 degrees C, 400 degrees C, 500 degrees C) from pure titanium and titanium dioxide targets. Some amorphous samples were annealed by the rapid thermal annealing method. The study is focused on the effect of variation of pressure of the reactive oxygen and the inert argon atmospheres, and the mixtures of both. The laser fluency varied in the range 2 J/cm(2) to 9 J/cm(2). The crystalline structure was characterized by X-ray diffraction and Raman Spectroscopy and for the study of the surface properties, atomic force microscopy was used. The TiO2 photocatalytic characteristics were determined using 4-chlorphenol solution degradation evaluated by pH measurement. Polycrystalline (anatase, rutile, and brookite) and amorphous layers exhibiting photocatalytic behavior were obtained at low substrate temperatures (200 degrees C).

Crystalline and amorphous hydroxyapatite (HA) films were prepared by KrF pulsed laser deposition method. Influence of HA structure on biomedical properties was studied. Crystallinity, morphology, composition, optical transmission and mechanical properties (adhesion) were measured. Biomedical properties were tested using human dermal fibroblast. The specific proteins (vimentin, fibronectin, pankeratin, keratin 14) were visualized. The worst proliferation of fibroblasts was observed on the amorphous coating, whereas the adhesion was well comparable with other surfaces. The level of keratinocyte differentiation on the amorphous and crystalline HA coating was the same. Results reached on physical and mechanical properties are discussed in connection with results of in vitro tests.

Titanium–carbide films were grown using a magnetron assisted pulse laser deposition combining KrF pulsed laser deposition and DC magnetron sputtering (PLDMS). Plasma streams produced by magnetron and laser ablation were intersected on the substrate surface. Films' properties were characterized by GDOES, AFM, XRD, XPS as well as by Raman spectroscopy. The adhesion and microhardness were also studied. Crystalline TiC films were fabricated at room temperature.

Titanium- carbonitride thin films were grown at room temperature using a hybrid deposition arrangement combining DC magnetron sputtering and KrF pulsed laser deposition (MSPLD). Carbon and titanium were simultaneously deposited on the same Si substrate, dimensions of 3 cm x 3 cm. Films were fabricated in argon-nitrogen atmosphere of 1 Pa - 5 Pa, for laser fluence of 15 Jcm(-2) and magnetron power of 150 W. Film properties were modified by RF discharge held between the target and substrate. Film crystallinity was studied by XRD and the composition depth profile of TiCN layers by glow discharge optical emission spectroscopy (GDOES).

We prepared nanostructured coatings composed of diamond-like carbon (DLC), titanium and titanium carbide using a new hybrid technique combining pulsed laser deposition (PLD) with magnetron sputtering. The whole deposition process was fully computer controlled. The coatings consist from a number of 1–20 nm-thick alternating particular layers forming in total 0.4 μm-thick structure. A set of samples with different relative composition of Ti, TiC and DLC were prepared. Thin interlayer of titanium carbide was formed by simultaneous process of pulsed laser deposition (carbon) and magnetron sputtering (Ti). Microstructure was characterized by XRD. Mechanical properties were measured. The deposition process was investigated using an optical emission spectroscopy. The plasma was analyzed with a spatial and a time resolution.

An excimer laser combined with magnetron sputtering was used for TiC-layer deposition. Various laser-magnetron configurations and deposition regimes were tested. The growth rate and the film-thickness homogeneity were studied. The film properties were characterized by XRD, Raman spectroscopy, scratch test, and microhardness measurements. Plasma plumes were detected by optical-emission spectroscopy. Films containing TiC nanocrystals embedded in a-C matrix were fabricated at room substrate temperature on large-area silicon substrates.

Thin films were grown by pulsed laser deposition from Bi2Te3 target on fused silica substrates at substrate temperature of 410 °C. The reproducibility of the process was confirmed. The films were completely crystalline, textured with BiTe, Bi2Te3 and Bi3Te4 phases present. Bi/Te ratio in the films varied from 1.15 to 1.23. Films with various thicknesses were grown at the same deposition conditions in the second experiment. Film thickness varied from 20 to 350 nm. Hall mobility and the concentration of carrier of the films with different thicknesses were measured and oscillations were observed.

The Bi2Te3 thin films with various thicknesses were prepared by laser ablation in vacuum using the KrF excimer laser. The energy density of laser was set at 5 J/cm2 (resp. at 2 J/cm2 in the second experiment). The substrate temperature was held at 410 °C. The influence of thickness on the Hall mobility and conductivity at room temperature is presented.

The figure of merit ZT is measured by a Harman method on simple devices prepared on single thermoelectric layers of different thicknesses. The thermoelectric layers are prepared at different conditions by laser ablation from Bi2Te3 target. The best measured figure of merit ZT is for our devices ZT=2.65. This result is comparable with the results obtained on superlattices. ZT oscillated with the thickness of the layers. On some devices the Seebeck coefficient is measured and using conductivity measurements along the thermoelectric layers the thermal conductivity is estimated from ZT. The low thermal conductivity of samples is explained by the quantum size effect and by existence of few phases of type Bi2(m+n)Te3n in the thermoelectric layers.

Thin YAG (Y3Al5O12) and YAP (YAlO3) films doped with Er content were grown by sub-picosecond (450 fs) KrF laser deposition from crystalline Er: YAG and Er: YAP laser rods. The influence of laser power density, substrate temperature, target- substrate distance and deposition ambient atmosphere (vacuum or oxygen) was studied. Results of morphological, compositional, structural and luminescence analysis are presented. Crystalline films have been obtained even for low substrate temperature. Luminescence corresponding to Er+3 ions was observed for all the samples.

In the present paper, microstructure, phase composition and elevated temperature behaviour of two rapidly solidified (RS) AlCr6Fe2Ti(0–1.5)Si1 (in wt.%) powder alloys are described. Rapidly solidified powders were composed of α(Al) solid solution matrix and finely dispersed intermetallic phases of spherical or irregular shapes. XRD and TEM investigations revealed the presence of quasi-crystalline icosahedral Al84.6Cr15.4, Al82Fe18, Al95Fe4Cr, Al74Cr20Si6 and crystalline Al, Al13Cr2, Al13Fe4, Al3FeSi phases. The fraction of quasi-crystalline phases in the form of spheroids was reduced as the powder particle size increased. The presence of titanium significantly increases the fraction of icosahedral phases. DTA measurement revealed an exothermic reaction at 450–500°C in the fine powder fraction (size 25–45μm) of the AlCr6Fe2Ti1.5Si1 alloy. This fraction also exhibited a hardening after annealing at 350°C/50h. The hardening, as well as the exothermic effect were due to a decomposition of the icosahedral phases described by the reaction Al95Fe4Cr(Ti, Si) + Al84.6Cr15.4(Ti, Si) + Al74Cr20Si6(Fe, Ti) → Al13Cr2 + Al3FeSi + TiSi.

We report on fabrication of the GaN layers deposited onto silicon, silica-on-silicon and quartz glass substrates by RF magnetron sputtering. The GaN layers were also doped with erbium ions to achieve active optical properties. The fabricated layers were characterized by a number of methods and the results are discussed on the bases of quality of the deposited GaN structures.

Optical properties of Er:YAG and Er:YAP materials and layers were studied. Layers were grown by KrF laser ablation (248 nm, 20 ns) from Er-doped targets. Composition, crystallinity, luminescence and results of spectroscopic ellipsometry are discussed. Films were mostly amorphous for substrate temperatures up to ~ 975 °C. Luminescence corresponding to Er+3 ions was observed on all samples. Waveguiding properties were estimated.

The title salt, C7H9ClN+.H2PO4-, is monoclinic (P2(1)/c). The ions are held together by O-H...O and N-H...O hydrogen bonds. The O-H...O bonds interconnect the dihydrogenphosphates into sheets which are parallel to the (100) plane. In each sheet, there are centrosymmetric pairs of dihydrogenphosphates held together by O-H...O bonds. In addition, the dihydrogenphosphates are interconnected by D NH3 groups. Each H atom from an -NH3 group is donated to a different dihydrogenphosphate ion. A differential scanning calorimetry experiment showed no anomaly between 98 and 420 K.

Thin films of Er:YAG and Er:YAP were deposited by subpicosecond (450fs) and nanosecond (20ns) KrF laser (λ=248nm) on YAG, YAP, fused silica, silicon and sapphire substrates. Laser spot size, energy density, substrate temperature and deposition ambient (vacuum and oxygen) were varied. Comparison of growth rate, morphology, composition, crystallinity and adhesion of the films grown by subpicosecond and nanosecond deposition is presented.

The Nd doped KGW films were deposited on MgO substrates, in oxygen ambient atmosphere, at substrate temperatures varied from 400 to 800degreesC. The crystallinity, stoichiometry, fluorescence, refractive index and waveguiding properties were studied. The best crystalline structures and strongest fluorescence signal exhibited films created at high temperatures. The films supported one mode at TE and TM polarizations at 633 and 1550 nm, with propagation losses of 5-6 dBcm(-1) at 633 nm wavelength.

Er- doped YAG and YAP layers were grown by nanosecond (20 ns) and subpicosecond (450 fs) KrF laser ablation under a wide set of deposition conditions. Results of characterization of films crystallinity and luminescence are presented and discussed. Films grown in ns regime were almost amorphous for substrate temperature to Ts ~ 1000 oC, while films grown in subps regime were partly crystalline, even at low Ts. Film crystallinity was also studied after annealing of amorphous layers under vacuum with CO2 and KrF excimer lasers. Luminescence corresponding to Er+3 ions was observed for all samples.

PbTiO3–Al2O3 composite films were prepared by chemical solution deposition on silica glass substrates using dip-coating and lead acetate trihydrate, titanium butoxide and aluminum isobutoxide as precursors. The phase composition, preferred orientation and crystallite dimension were determined by powder X-ray diffraction methods. The Al2O3 phase seems to be amorphous because of the absence of its diffraction peaks. The presence of this phase affects the preferential orientation of PbTiO3 crystallites. For the molar ratio nPb/nAl=2−4 most films show a strong texture of PbTiO3 crystallites with the a-axis oriented almost perpendicularly to the film plane and the c-axis oriented randomly in the film plane. The texture is much weaker in pure PbTiO3 films. The texture may originate from the minimization of surface and interface energies and from tensile stresses induced during film preparation.