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排名必读论文期刊顶会热点AI 简史溯源树小脉星探人才迁徙塔尖人才国防情报追踪开源工具智慧手语
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论文共 9 篇作者统计合作学者相似作者

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Machine learning for modeled-TIS and overlay reduction
Shlomit Katz, Boaz Ophir,Udi Shusterman,Anna Golotsvan, Liran Yerushalmi, Efi Megged, Yoav Grauer, Jian Zhang, Alimei Shih,Shi-Ming Wei, Judith Yep, Fiona Leung,
Metrology, Inspection, and Process Control for Microlithography XXXIV (2020)
引用1浏览0引用
1
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Opo Residuals Improvement With Imaging Metrology For 3d Nand
Shlomit Katz,Anna Golotsvan,Yoav Grauer, Efi Megged,Greg Gray, Fiona (Shuk-Fan) Leung, Pek Beng Ong,Shi Lei, Jeremy (Shi-Ming) Wei, Wayne (Wei) Zhou,Linfei Gao
METROLOGY, INSPECTION, AND PROCESS CONTROL FOR MICROLITHOGRAPHY XXXIV (2020)
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1
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Accuracy optimization with wavelength tunability in overlay imaging technology
Honggoo Lee, Yoonshik Kang, Sangjoon Han, Kyuchan Shim,Minhyung Hong,Seungyoung Kim,Jieun Lee,Dongyoung Lee, Eungryonh Oh, Ahlin Choi,Youngsik Kim,Tal Marciano,
Proceedings of SPIE (2018)
引用3浏览0引用
3
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Overlay and stitching metrology for massively parallel electron-beam lithography (Conference Presentation)
Guido Rademaker,Jonathan Pradelles,Stefan Landis,Stephane Rey,Anna Golotsvan, Anat Marchelli, Tal Itzkovich, T. Shapoval,Ronny Haupt, Erwin Slot, Guido De Boer,Dhara Dave,
Metrology, Inspection, and Process Control for Microlithography XXXII (2018): 177-189
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