Three Mn-Co-Ni-Cu-O thermosensitive films and corresponding sensors were prepared using some new technical routes and manufacturing processes. The micro-morphology, chemical valence and crystal phase of the three thermosensitive films were analyzed using scanning electron microscope (SEM), X-ray photoelectron spectroscopy (XPS), transmission electron microscope (TEM), etc. The resistance-temperature characteristics of the three sensors in the regions of room temperature, general cooling temperature and low temperature were measured using a wheatstone bridge equipment and a self-developed low temperature resistance-temperature measurement system. The films had thickness of (7.73-7.82) mu m and surface roughness of (15.9-22.7) nm. The films contained C, Mn, Co, Ni and O elements and their cations were Mn2+, Mn3+, Mn4+, Co2+, Ni2+ and Ni3+. The largest ratio of Mn3+/Mn4+ was 0.94 and the main phases were MnO2, CoMn2O4, MnNi2O4 and NiMn2O4. The resistances of the three sensors decreased with the increase of temperature in the room temperature of (288.15-308.15) K, which displayed a good negative temperature coefficient (NTC) linearity. The resistance-temperature relationships of the sensors in a range of continuous temperature change (10 K-294 K) revealed a NTC characteristic, a resistance jump phenomenon at low temperature of (10-40) K, a resistance-temperature linearity at the general cooling temperature of (33-50) K and the room temperature of (218-286) K. The sensor deposited at 450 min had the widest resistance-temperature linearity, i.e., the best temperature measurement performance. The best sensor was characteristic without shedding or cracking, resistance smaller than 0.4 k Omega without annealing.

In this paper, an optical waveguide evanescent field fluorescence microscopy is studied. Based on Maxwell's equation, a seven‐layer theoretical analysis model is developed for the evaluation of an optical waveguide excitation fluorescence microscopy. The optical waveguide excitation fluorescence microscopy structure is systematically and comprehensively analysed at the wavelengths of 488, 532 and 646 nm for fluorescent dyes. The analysis results provide some useful suggestions, which will be beneficial to the research of an optical waveguide evanescent field fluorescence microscopy.

An optical waveguide microcantilever sensor with a dual-output waveguide readout is developed to obtain a linear response for the deflection of cantilever. A finite element method is employed to characterize the optical waveguide microcantilever sensor. A systematic and detailed discussion has been presented to describe an optical waveguide cantilever sensor with a dual-output waveguide. One can see that most of the results are interesting, even very different from general opinions. The design is a tradeoff of the sensitivity, linearity and operation range. These will be helpful for an optimized design of the microcantilever sensor.

An integrated opto-mechanical cantilever sensor with a rib waveguide is reported in this paper. The device consists of a rib waveguide cantilever with buried waveguides on silicon. The rib cantilever is introduced to match better with the buried waveguide, further for increasing the interface coupling efficiency. With this configuration, single-mode operating can be achieved in transverse direction without decreasing the width of optical waveguide cantilever. The system sensitivity is 1.1 μm-1 which is increased by about 21%, compared with the conventional structure.

There is an urgent need for high-speed atomic force microscopy (AFM) systems, and chip-AFM on an integrated optical waveguide provides a perfect solution. A differential splitter of double waveguides is introduced as a readout method of an integrated optical waveguide AFM to overcome the non-linear response of a conventional optical waveguide AFM. Results show that an optical waveguide AFM with a 190 nm width and 1 mu m height nano-tip shows a good monotonic dependence on the cantilever deflection within a range of +/- 0.4 mu m using a differential splitter readout method. (C) 2022 Society of Photo-Optical Instrumentation Engineers (SPIE)

Carbon nanotubes (CNTs) can be used as atomic force microscopy (AFM) tips for high-resolution scanning due to their small diameter, high aspect ratio and outstanding wear resistance. However, previous approaches for fabricating CNT probes are complex and poorly controlled. In this paper, we introduce a simple method to selectively fabricate a single CNT on an AFM tip by controlling the trigger threshold to adjust the amount of growth solution attached to the tip. The yield rate is over 93%. The resulting CNT probes are suitable in length, without the need for a subsequent cutting process. We used the CNT probe to scan the complex nanostructure with a high aspect ratio, thereby solving the long-lasting problem of mapping complex nanostructures.

This paper reports quasi-linear response of the signal with cantilever deflection for an integrated optical waveguide biosensor by a double output readout method. The readout method uses a double output waveguide structure to divide the received light into two power signals, further for achieving the differential signal as the operating signal. With this method, the operation signal has a good monotonicity with cantilever deflection in range of +/- 0.4 mu m.

单晶硅晶格间距是许多重要物理常数测量的基础.本文介绍了硅晶格间距测量技术的发展历程,包括X射线干涉仪直接测量和晶格比较仪间接测量两种方法,以及影响测量结果不确定度的关键因素.得益于晶格间距测量的进展,在纳米尺度,硅晶格间距被国际计量局(BIPM)批准成为新的米定义复现形式.最后介绍了硅晶格在计量学中的应用,以及基于硅晶格实现纳米几何量测量的溯源体系的研究趋势.

台阶高度作为纳米计量领域中的一个具有代表性的参数,其评定方法层出不穷,本文对现有的台阶高度评定方法进行了介绍,并对其重复性以及一致性进行了分析.结果表明:点对点法和直方图算法受噪声等畸变影响较大,重复性较差;而对直方图算法进行改进,台阶高度由计算直方图中分别对应台阶高、低区域的峰值的横坐标之差转而计算重心的横坐标之差,重复性提高;ISO法、最小二乘多项式拟合法和光学显微解耦合准则重复性较好,计算结果更稳定.通过计算归一化偏差En值来判别6个评价方法的一致性,结果表明其测量结果等效一致.

Abstract Atomic force microscopy (AFM) is widely used to characterize the surface topography in nanomaterials and biology research since the high resolution in 3 dimensions. Height measurement is important in the investigation of graphene thickness. Due to some AFMs use tube scanner, the curved scanning distortion will cause height measurement error. Step height standards calibrated by metrological AFM are used to calibrate the Z axis of conventional AFMs. However, for step structure with large width, the method specified in ISO 5436 is not suitable. The distortion of the curvature scanning is discussed for different samples, and for large step width the influence is significant. So the substrate correction method is proposed to eliminate the scanning curvature and the comparison with several other fitting correction methods is also discussed.

This paper presents the control and non-linear calibration of large-scale two-dimensional nanometer displacement stage. The stage consists of a monolithic compliant mechanism, which using flexible hinge superimposed branch as a transmission part, driven by three piezoelectric actuators, To certify excellent performance of the stage, a micro-displacement measurement system which based on the measurement principle of a laser interferometer was setted up, then comparison of several stage parameters accomplished between before and after calibration. Based on the measurement of optical path and composition of dual-frequency laser interferometer, a experimental study on nano-positiong stage was carried out. The non-linear calibration method which based on newton-steffensen accelerated iteration are described; The accuracy of the calibration method was verified through experiments. Experiments show that: before calibration, the maximum nonlinearity error of x-axis and y-axis were 4.012 mu m and 2.875 mu m. after calibration, the maximum non-linearity of the x-axis is 8 nm and the maximum nonlinearity error of the y-axis is 10 nm, Meanwhile, a mathematical model is established to calculate the coupled displacement and yaw angle, The actual coupled displacement and yaw angle of X\Y were limited to 380nm and 1.4 mu rad.

In this paper we report on experiments generating complex one-dimensional nanoscale patterns with the laser-focused atomic deposition technique. A beam of collimated chromium atoms intersect with an exact on-resonant laser standing wave at 7S3 → 7 P 4 0 transition of 52Cr. With the usage of proper laser intensity and reflectivity of the retroreflecting mirror, which are used to form the standing wave, nanolines with complex spatial frequencies (both λ/2 and λ/4) can be fabricated in one-step deposition. The proportion of the two structures could be 1:1.

Heterodyne interferometer is a nanometer measurement system that uses the laser wavelength as the working reference for length measurement. Under ideal conditions, the laser wavelength is the wavelength lambda(0). of the light wave in the vacuum, but in practical applications, the laser wavelength will change with the influence of the air refractive index and the refractive index of air is greatly affected by the environment. This will have a great influence on the measurement results of the high-precision and high-resolution nano-displacement measurement system. Therefore, it is necessary to correct the air refractive index to compensate the laser wavelength. In this paper, the air refractive index in the initial measurement is obtained by using the Edlen empirical formula. Then the relationship between the current air refractive index and the initial air refractive index is obtained by using the wavelength compensation unit to achieve the automatic real-time compensation of the wavelength. The wavelength compensation component is mainly composed of an interference mirror and a fixed length etalon. Through the measurement of air refractive index and the experiment of compensation, the feasibility of the method is confirmed. The relative error after wavelength compensation is less than 0.03% relative to the relative error before compensation.

Angular displacement mechanisms are widely used in X-ray diffraction and the nrad resolution is essential for high resolution X-ray diffractor. A multi-pass differential interferometer is designed to improve the resolution of the angel to similar to 10 nrad by increasing the optical pass length. For common interferometer based on Michelson interferometry, nonlinearity is caused by phase mixing due to the imperfect of polarization optical components in both homodyne and heterodyne interferometers. In this angular measurement interferometer, the laser beam of the reference path and measuring path are separated to eliminate the mixture and to reduce the nonlinearity. The four-pass design of the reference and measuring beam improve the resolution. The performance of the interferometer can be used measure the small angle generated by compact piezo driven flexure hinge stage.

The surface topography of micro-structures would significantly affect the products quality and industrial performance of micro-nano devices [1]. In recent years, the application of micro-structures in Micro Electro Mechanical Systems (MEMS) and integrated circuit is more and more widely. How to reflect the 3D surface topography of these micro structures accurately and measure the surface’s parameters precisely as well as quickly are becoming a hot research area of precision measurement. White-light interference microcopy technology is one of the most widely used non-contacting measurement methods at present, which has the advantages of nondestructive, fast measurement and high accuracy, has been widely applied in surface topography measurement of micro structures. In this paper, an analysis method of microstructure surface topography algorithm based on wavelet filter to analyze white interference signals is proposed, this method utilizes R/G/B three channels color information which is significantly superior to traditional black and white imaging process method. The experimental results shows that this method has good accuracy and repeatability in 3D surface measurement.

纳米压印光刻技术具有低成本、高效率、大面积、高分辨、多尺度、良好的工艺兼容性等特点,可用于亚波长光电子器件的研究.提出了硅水合物(HSQ)/聚丙烯酸甲酯(PMMA)双层胶室温纳米压印工艺方法,研究并解决了有关压印光刻胶剩余底膜和纳米图形保真性刻蚀转移的两个关键工艺技术问题.以制备特定需求的石英纳米光栅器件为目标,经过工艺优化,成功地实现了周期200 nm、占空比0.5、深宽比5∶1、栅线侧壁垂直且粗糙度小于3 nm的高分辨率亚波长光栅的制备.所提出的双层胶刻蚀方法,有望拓展到纳米标准物质和芯片级光学频率梳器件等对侧壁陡直和粗糙度有严格要求的应用领域.

In order to realize the rapid measurement of the nanometer scale to the micro 3D step sample height, on the basis of ordinary optical microscope, a micro/nano step height measuring device is reconstructed.The whole hardware structure is designed.The measurement and control software and data processing software are programmed.Combined with Hilbert transform and wavelet transform, a new method of algorithm which is used for the reconstruction of 3D surface topography is proposed.The step samples of different height is used to test.The measurement results indicate that this system has high measurement accuracy and high repeatability, and its measurement range in vertical direction is not less than 50 μm.

Dual-probe Atomic Force Microscope (AFM) can effectively eliminate the influence of the probe size on measurement of the line width, and realize true three-dimensional measurement. Novel dual-probe AFM consists of probe system, scanning system, alignment system and displacement measurement system. As displacement measurement system, the interferometers are added to the novel dual-probes AFM. In order to simplify the dual-probe AFM structure, self-sensing tuning fork probe is used. Measurement method has two steps: the first step is to align two probes and obtain the reference point; the second step is to scan two sides of measured line by two probes separately, and calculate the line width value according to the reference point. In the alignment of two probes, the alignment method is improved by using the edge alignment and the feedback scanning alignment.

针对微纳坐标测量机的高精度性能指标无法精确校准的问题,提出了一种间接校准的方案.使用量块及标准球板校准微纳坐标测量机的尺寸测量示值误差,用标准球校准仪器的探测误差.并对中国计量科学研究院的微纳坐标测量机进行了校准实验,实验结果表明,该仪器的尺寸测量示值误小于0.2 μm,探测误差仅为0.125μm,校准结果均优于仪器的最大允许误差,验证了校准方案的合理可行性.