An industrial sol-gel method to prepare silica film with TEOS as precursor and ammonia, HCI as catalyst has been developed. In this paper, SiO2 antireflective (AR) coatings were dip-coated on low-iron glasses which encapsulate the crystalline silica solar cells. After surface modification on the film, the hydrophobicity of the film is improved and the contact angle is changed from 40 degrees to 110 degrees. Large area of AR coatings were designed and prepared, the average transmittance between 400 nm and 800 nm is increased by more than 5%. The hydrophobicity. and the scratch-resistant property of the film can meet the demands of industrial manufacture.

Nanoporous silica films were prepared by sol-gel process with base, acid and base/acid two-step catalysis. Transmission electron microscope (TEM) and particle size analyzer were used to characterize the microstructure and the particle size distribution of the sols. Scanning electron microscopy (SEM), atomic force microscopy (AFM) and spectroscopic ellipsometer were used to characterize the surface microstructure and the optical properties of the silica films. Stability of the sols during long-term storage was investigated. Moreover, the dispersion relation of the optical constants of the silica films, and the control of the microstructure and properties of the films by changing the catalysis conditions during sol-gel process were also discussed.

The SiO_2 antireflective coatings were dip-coated on solar cell subassembly glass by sol-gel method with TEOS as precursor and ammonia,hydrochloric acid as catalyst.After surface modification,the hydrophobicity of the film is im- proved and the contact angle is changed from 40°to 107°.Large area of antireflective coatings were designed and pre- pared,the average transmittance between 400nm and 800nm is increased by more than 5%.The hydrophobicity and the scratch-resistant property of the film can meet the demands of industrialization.

Inertial confinement fusion(ICF) establishment needs lots of high quality,large caliber and non-linear optical material potassium dihydrogen phosphate (KDP),which is water-soluble crystal.It is necessary to prepare a moisture-barrier protective film with good performance on the surface of KDP crystals.Antireflective SiO_2 coating has been prepared by tetraethyl orthosilicate(TEOS) and sol-gel route with dip coating method.The surface of SiO_2 film was disposed with teflon AF2400.The properties of the AF2400-SiO_2 composite film had been characterized and measured by atomic force microscope(AFM),Fourier transform infrared(FTIR),UV-VIS-NIR spectroscopes etc.The experimental results show that the light transmission of AF2400-SiO_2 composite film is 97.7% at 355 nm,the refractive index is 1.21.The AF2400-SiO_2 composite films have fine water-repellent performance,high laser damage threshold(19.5 J/cm~2) and excellent optical property.The composite film can be used for protection of KDP crystal.

In this paper,nano-porous silica films are prepared via Sol-Gel process with base,acid and base/acid two-step catalysis.TEM and Particle Size Analyzer are used to characterize the properties of the microstructure and particles size distribution of the sol.FE-SEM,AFM and Spectroscopic Ellipsometer are used to characterize the surface microstructure and optical properties of the film.Structure controlling by changing the catalysis conditions during Sol-Gel process is investigated,and the stability of the sol during long-term storage is studied.

Poly(p-xylylene) is a novel material applied in protection of optical components and crystals.Poly(p-xylylene) film was prepared by vacuum Chemical Vapor Deposition process. It is shown that the transmittance of film can be raised to more than 90%by SiO2 anti-reflective coating on its surface.FTIR,UV-visible spectra and XPS were used to characterize the structure and optical property of films. The mechanism of photooxidation of Poly(p-xylylene) film is also prelimiary analyzed .

The nano-porous SiO_(2) films with high laser damage threshold were prepared by using sol-gel process based on base and acid catalysis.Spectroscopic ellipsometer and FE-SEM were used to characterize the optical properties and surface microstructure of nano-porous SiO_2 film.The Cauchy model was presented well in fitting spectroscopic(ellipsometric) data for the film optical constants.The film optical constants in 300~700 nm waveband are obtained and the relation between microstructure and optical constants is also discussed.The difference of microstructure has no effect on the dispersion relation of the films while it has effect on the value of the optical constants. The refractive index is inversely proportional to the porosity of the film.

Parylene film prepared by vacuum chemical vapor deposition process and SiO_2 reflective film pre- pared by sol-gel technology were reported in this paper.By dip-coating process,parylene film could be associated with SiO_2 AR-coating to act as protective film of KDP crystal.FT-IR spectra,UV-visible spectra are used to charac- terize the structure and optical property of films.The transmittance of composite films can reach above 92% and the laser damage threshold is 8J/cm~2.The KDP crystals with protective film can maintain the transmittance after having been put in air for more than half years.

With the development of large-scale high power laser system, large size shortwave-band(such as 355nm)antireflective coatings are needed. In this paper, the Sol-Gel deriving SiO2 nano-structure shortwave-band antireflective coatings were prepared. Ellipsometer, FTIR, UV-Vis-VIR spectrometer and AFM were used to characterize the properties of the films. The refractive index of the film is about 1.22, and the thickness is 75nm. The reflectance of the film(on silica substrate)at 355nm is reduced to 0.2%. The scratch-resistant property of film was improved obviously after ammonia treatment, the maximum transmission values of the film are only reoluced 0.13% and 0.39% after 20 and 50 times scratch by the tampon with dirty. After surface modification the hydrophobicity of the film is improved and the contact angle is about 110°.

Silicate sols were obtained from tetraethoxysilane (TEOS) dissolved in ethanol in base catalyzed system by sol-gel process. Both hydrophobic and anti-reflective silica films were prepared by the dip-coating technique from the sols and surface modification. As a result, the moisture-resistant ability of anti-reflective coating was highly improved. Ellipsometry, FTIR, UV-VIS-NIR spectrophotometry and contact angle instrument are used to measure the physical properties of the films.

采用溶胶-凝胶工艺制备了SiO2与ZrO2单层介质膜，用输出波长1.06μm，脉宽15ns的电光调Q激光系统产生的强激光进行辐照实验。观察了光学薄膜经强激光辐照后的损伤情况，讨论了溶胶-凝胶光学薄膜在强激光照射下的损伤机理，提出了溶剂替换、紫外光处理、添加有机粘接剂等提高溶胶-凝胶光学薄膜激光损伤阈值的方法.

To overcome the shortcomings of single layer antireflective (AR) coatings, a broadband AR coating composed of nanoporous SiO2 was prepared to reduce the mean reflectance in the visible region and improve the chromatic balance quality. In this paper, based on the thin film optical theory, the effects of optical parameters on reflectance were discussed and optical parameters of the coating were optimized. Structure controlled silica sols were made from TEOS with a base/acid twostep catalytic process by solgel method. And the broadband antireflectance (AR) silica film was obtained by spincoating. The coating was characterized with ellipsometer, FESEM, and spectrophotometer, respectively. The results show that the coating has an excellent broadband AR property with the only 0.44% reflectance in the visible region(400～760nm).