K. Abe, K. Abe, R. Abe, T. Abe, I. Adachi, Byoung Sup Ahn, H. Aihara, M. Akatsu, Y. Asano, T. Aso, V. Aulchenko, T. Aushev, A. M. Bakich, Y. Ban, E. Banas, W. Bartel, A. Bay, P. K. Behera, A. Bondar, A. Bozek, M. Bračko, J. Brodzicka, T. E. Browder, B. C. K. Casey, P. Chang, Y. Chao, B. G. Cheon, R. Chistov, S.-K. Choi, Y. Choi, M. Danilov, L. Y. Dong, J. Dragic, A. Drutskoy, S. Eidelman, V. Eiges, Y. Enari, C. Fukunaga, N. Gabyshev, A. Garmash, 10 T. Gershon, A. Gordon, R. Guo, F. Handa, T. Hara, Y. Harada, N. C. Hastings, H. Hayashii, M. Hazumi, E. M. Heenan, I. Higuchi, T. Higuchi, T. Hojo, T. Hokuue, Y. Hoshi, K. Hoshina, S. R. Hou, W.-S. Hou, H.-C. Huang, T. Igaki, Y. Igarashi, T. Iijima, K. Inami, A. Ishikawa, R. Itoh, M. Iwamoto, H. Iwasaki, Y. Iwasaki, H. K. Jang, J. Kaneko, J. H. Kang, J. S. Kang, P. Kapusta, N. Katayama, H. Kawai, Y. Kawakami, N. Kawamura, T. Kawasaki, H. Kichimi, D. W. Kim, Heejong Kim, H. J. Kim, H. O. Kim, Hyunwoo Kim, S. K. Kim, T. H. Kim, K. Kinoshita, P. Krokovny, R. Kulasiri, S. Kumar, A. Kuzmin, Y.-J. Kwon, J. S. Lange, 36 G. Leder, S. H. Lee, J. Li, D. Liventsev, R.-S. Lu, J. MacNaughton, G. Majumder, F. Mandl, S. Matsumoto, T. Matsumoto, 47 H. Miyake, H. Miyata, G. R. Moloney, T. Mori, T. Nagamine, Y. Nagasaka, E. Nakano, M. Nakao, J. W. Nam, Z. Natkaniec, K. Neichi, S. Nishida, O. Nitoh, S. Noguchi, T. Nozaki, S. Ogawa, F. Ohno, T. Ohshima, T. Okabe, S. Okuno, S. L. Olsen, Y. Onuki, W. Ostrowicz, H. Ozaki, P. Pakhlov, H. Palka, C. W. Park, H. Park, K. S. Park, L. S. Peak, J.-P. Perroud, M. Peters, L. E. Piilonen, N. Root, H. Sagawa, S. Saitoh, Y. Sakai, M. Satapathy, A. Satpathy, 5 O. Schneider, S. Schrenk, C. Schwanda, 13 S. Semenov, K. Senyo, R. Seuster, M. E. Sevior, H. Shibuya, V. Sidorov, J. B. Singh, S. Stanič, ∗ M. Starič, A. Sugi, A. Sugiyama, K. Sumisawa, T. Sumiyoshi, 47 K. Suzuki, S. Suzuki, S. K. Swain, T. Takahashi, F. Takasaki, K. Tamai, N. Tamura, M. Tanaka, G. N. Taylor, Y. Teramoto, S. Tokuda, T. Tomura, S. N. Tovey, W. Trischuk, † T. Tsuboyama, T. Tsukamoto, S. Uehara, K. Ueno, Y. Unno, S. Uno, S. E. Vahsen, G. Varner, K. E. Varvell, C. C. Wang, C. H. Wang, J. G. Wang, M.-Z. Wang, Y. Watanabe, E. Won, B. D. Yabsley, Y. Yamada, A. Yamaguchi, Y. Yamashita, M. Yamauchi, H. Yanai, J. Yashima, Y. Yuan, Y. Yusa, Z. P. Zhang, V. Zhilich, and D. Žontar

Multi-beam mask writer is under development to solve the throughput and patterning resolution problems in VSB mask writer. Theoretically, the writing time is appropriate for future design node and the resolution is improved with multi-beam mask writer. Many previous studies show the feasible results of resolution, CD control and registration. Although such technical results of development tool seem to be enough for mass production, there are still many unexpected problems for real mass production.In this report, the technical challenges of multi-beam mask writer are discussed in terms of production and application. The problems and issues are defined based on the performance of current development tool compared with the requirements of mask quality. Using the simulation and experiment, we analyze the specific characteristics of electron beam in multi-beam mask writer scheme. Consequently, we suggest necessary specifications for mass production with multi-beam mask writer in the future.

S. H. Lee, K. Suzuki, K. Abe, K. Abe, T. Abe, I. Adachi, Byoung Sup Ahn, H. Aihara, K. Akai, M. Akatsu, M. Akemoto, Y. Asano, V. Aulchenko, T. Aushev, A. M. Bakich, Y. Ban, S. Banerjee, A. Bay, I. Bedny, I. Bizjak, A. Bondar, A. Bozek, M. Bračko, T. E. Browder, P. Chang, Y. Chao, K.-F. Chen, B. G. Cheon, R. Chistov, S.-K. Choi, Y. Choi, A. Chuvikov, M. Danilov, L. Y. Dong, J. Dragic, A. Drutskoy, S. Eidelman, V. Eiges, Y. Enari, J. Flanagan, C. Fukunaga, K. Furukawa, N. Gabyshev, A. Garmash, 7 T. Gershon, B. Golob, 12 R. Guo, J. Haba, C. Hagner, F. Handa, N. C. Hastings, H. Hayashii, M. Hazumi, I. Higuchi, T. Hokuue, Y. Hoshi, W.-S. Hou, H.-C. Huang, Y. Igarashi, T. Iijima, H. Ikeda, K. Inami, A. Ishikawa, R. Itoh, H. Iwasaki, M. Iwasaki, Y. Iwasaki, H. Kakuno, J. H. Kang, J. S. Kang, P. Kapusta, S. U. Kataoka, N. Katayama, H. Kawai, H. Kawai, T. Kawasaki, H. Kichimi, E. Kikutani, H. J. Kim, Hyunwoo Kim, J. H. Kim, S. K. Kim, K. Kinoshita, H. Koiso, S. Korpar, P. Križan, 12 P. Krokovny, R. Kulasiri, A. Kuzmin, Y.-J. Kwon, J. S. Lange, 33 G. Leder, T. Lesiak, J. Li, A. Limosani, S.-W. Lin, D. Liventsev, J. MacNaughton, F. Mandl, D. Marlow, M. Masuzawa, T. Matsumoto, A. Matyja, S. Michizono, T. Mimashi, W. Mitaroff, H. Miyake, H. Miyata, D. Mohapatra, G. R. Moloney, T. Mori, T. Nagamine, Y. Nagasaka, T. Nakadaira, T. T. Nakamura, E. Nakano, M. Nakao, H. Nakazawa, Z. Natkaniec, S. Nishida, O. Nitoh, T. Nozaki, S. Ogawa, Y. Ogawa, K. Ohmi, Y. Ohnishi, T. Ohshima, N. Ohuchi, K. Oide, T. Okabe, S. Okuno, S. L. Olsen, W. Ostrowicz, H. Ozaki, C. W. Park, H. Park, K. S. Park, N. Parslow, L. S. Peak, M. Peters, L. E. Piilonen, N. Root, H. Sagawa, S. Saitoh, Y. Sakai, T. R. Sarangi, M. Satapathy, A. Satpathy, 3 O. Schneider, J. Schümann, C. Schwanda, 10 A. J. Schwartz, S. Semenov, K. Senyo, R. Seuster, M. E. Sevior, H. Shibuya, T. Shidara, B. Shwartz, V. Sidorov, J. B. Singh, N. Soni, S. Stanič, ∗ M. Starič, R. Sugahara, A. Sugi, K. Sumisawa, T. Sumiyoshi, S. Suzuki, F. Takasaki, K. Tamai, N. Tamura, M. Tanaka, M. Tawada, G. N. Taylor, Y. Teramoto, T. Tomura, K. Trabelsi, T. Tsuboyama, T. Tsukamoto, S. Uehara, Y. Unno, S. Uno, G. Varner, K. E. Varvell, C. C. Wang, C. H. Wang, J. G. Wang, M.-Z. Wang, Y. Watanabe, E. Won, B. D. Yabsley, Y. Yamada, A. Yamaguchi, Y. Yamashita, M. Yamauchi, H. Yanai, Heyoung Yang, M. Yoshida, Y. Yusa, S. L. Zang, J. Zhang, Z. P. Zhang, Y. Zheng, V. Zhilich, D. Žontar, 12 and D. Zürcher

We report a search for the flavor-changing neutral current decay B → K(∗)l+l− using a 29.1 fb−1 data sample accumulated at the Υ(4S) resonance with the Belle detector at the KEKB e+e− storage ring. The decay process B → Kμ+μ− is observed, for the first time, with a branching fraction of B(B → Kμ+μ−) = (0.99 −0.32 −0.14)×10. In addition, we set 90% confidence level upper limits B(B → Ke+e−) < 1.3×10−6, B(B → K∗e+e−) < 5.6×10−6 and B(B → K∗μ+μ−) < 3.1 × 10−6. PACS numbers: 11.30.Hv, 13.20.He, 13.25.Hw Typeset using REVTEX

We report a determination of the B d-B̄ 0 d mixing parameter ∆md based on the time evolution of dilepton yields in Υ(4S) decays. The measurement is based on a 5.9 fb−1 data sample collected by the Belle detector at KEKB. The proper-time difference distributions for same-sign and opposite-sign dilepton events are simultaneously fitted to an expression containing ∆md as a free parameter. Using both muons and electrons, we obtain ∆md = 0.463 ± 0.008 (stat.)± 0.016 (sys.) ps−1. This is the first determination of ∆md from time evolution measurements at the Υ(4S). We also place limits on possible

We report a search for the flavor-changing neutral current decay B → Xsl +l− using a 29.5 fb−1 data sample accumulated at the Υ(4S) resonance with Belle detector at the KEKB e+e− storage ring. We observe evidence for B → Kμ+μ− and report the preliminary branching fraction of B(B → Kμ+μ−) = (0.99 −0.32 +0.13 −0.15) × 10−6. We also set the following 90% confidence level upper limits on the branching fractions for exclusive and inclusive decays, B(B → Ke+e−) < 1.2 × 10−6, B(B → K∗(892)e+e−) < 5.1 × 10−6, B(B → K∗(892)μ+μ−) < 3.0 × 10−6, B(B → Xsee) < 10.1 × 10−6, B(B → Xsμμ) < 19.1 × 10−6. Typeset using REVTEX

We report measurements of the branching fractions for B0 → π+π−, K+π−, K+K− and K0π0, and B+ → π+π0, K+π0, K0π+ and K+K0. The results are based on 10.4 fb−1 of data collected on the Υ(4S) resonance at the KEKB e+e− storage ring with the Belle detector, equipped with a high momentum particle identification system for clear separation of charged π and K mesons. We find B(B0 → π+π−) = (0.56 +0.23 −0.20 ± 0.04) × 10−5, B(B0 → K+π−) = (1.93 +0.34 +0.15 −0.32 −0.06) × 10−5, B(B+ → K+π0) = (1.63 +0.35 +0.16 −0.33 −0.18) × 10−5, B(B+ → K0π+) = (1.37 +0.57 +0.19 −0.48 −0.18) × 10−5, and B(B0 → K0π0) = (1.60 +0.72 +0.25 −0.59 −0.27)× 10−5, where the first and second errors are statistical and systematic. We also set upper limits of B(B+ → π+π0) < 1.34 × 10−5, B(B0 → K+K−) < 0.27 × 10−5, and B(B+ → K+K0) < 0.50 × 10−5 at the 90% confidence level. PACS numbers: 13.25.Hw, 14.40.Nd

S. H. Lee, K. Suzuki, K. Abe, K. Abe, T. Abe, I. Adachi, Byoung Sup Ahn, H. Aihara, K. Akai, M. Akatsu, M. Akemoto, Y. Asano, V. Aulchenko, T. Aushev, A. M. Bakich, Y. Ban, S. Banerjee, A. Bay, I. Bedny, I. Bizjak, A. Bondar, A. Bozek, M. Bračko, T. E. Browder, P. Chang, Y. Chao, K.-F. Chen, B. G. Cheon, R. Chistov, S.-K. Choi, Y. Choi, A. Chuvikov, M. Danilov, L. Y. Dong, J. Dragic, A. Drutskoy, S. Eidelman, V. Eiges, Y. Enari, J. Flanagan, C. Fukunaga, K. Furukawa, N. Gabyshev, A. Garmash, 7 T. Gershon, B. Golob, 12 R. Guo, J. Haba, C. Hagner, F. Handa, N. C. Hastings, H. Hayashii, M. Hazumi, I. Higuchi, T. Hokuue, Y. Hoshi, W.-S. Hou, H.-C. Huang, Y. Igarashi, T. Iijima, H. Ikeda, K. Inami, A. Ishikawa, R. Itoh, H. Iwasaki, M. Iwasaki, Y. Iwasaki, H. Kakuno, J. H. Kang, J. S. Kang, P. Kapusta, S. U. Kataoka, N. Katayama, H. Kawai, H. Kawai, T. Kawasaki, H. Kichimi, E. Kikutani, H. J. Kim, Hyunwoo Kim, J. H. Kim, S. K. Kim, K. Kinoshita, H. Koiso, S. Korpar, P. Križan, 12 P. Krokovny, R. Kulasiri, A. Kuzmin, Y.-J. Kwon, J. S. Lange, 33 G. Leder, T. Lesiak, J. Li, A. Limosani, S.-W. Lin, D. Liventsev, J. MacNaughton, F. Mandl, D. Marlow, M. Masuzawa, T. Matsumoto, A. Matyja, S. Michizono, T. Mimashi, W. Mitaroff, H. Miyake, H. Miyata, D. Mohapatra, G. R. Moloney, T. Mori, T. Nagamine, Y. Nagasaka, T. Nakadaira, T. T. Nakamura, E. Nakano, M. Nakao, H. Nakazawa, Z. Natkaniec, S. Nishida, O. Nitoh, T. Nozaki, S. Ogawa, Y. Ogawa, K. Ohmi, Y. Ohnishi, T. Ohshima, N. Ohuchi, K. Oide, T. Okabe, S. Okuno, S. L. Olsen, W. Ostrowicz, H. Ozaki, C. W. Park, H. Park, K. S. Park, N. Parslow, L. S. Peak, M. Peters, L. E. Piilonen, N. Root, H. Sagawa, S. Saitoh, Y. Sakai, T. R. Sarangi, M. Satapathy, A. Satpathy, 3 O. Schneider, J. Schümann, C. Schwanda, 10 A. J. Schwartz, S. Semenov, K. Senyo, R. Seuster, M. E. Sevior, H. Shibuya, T. Shidara, B. Shwartz, V. Sidorov, J. B. Singh, N. Soni, S. Stanič, ∗ M. Starič, R. Sugahara, A. Sugi, K. Sumisawa, T. Sumiyoshi, S. Suzuki, F. Takasaki, K. Tamai, N. Tamura, M. Tanaka, M. Tawada, G. N. Taylor, Y. Teramoto, T. Tomura, K. Trabelsi, T. Tsuboyama, T. Tsukamoto, S. Uehara, Y. Unno, S. Uno, G. Varner, K. E. Varvell, C. C. Wang, C. H. Wang, J. G. Wang, M.-Z. Wang, Y. Watanabe, E. Won, B. D. Yabsley, Y. Yamada, A. Yamaguchi, Y. Yamashita, M. Yamauchi, H. Yanai, Heyoung Yang, M. Yoshida, Y. Yusa, S. L. Zang, J. Zhang, Z. P. Zhang, Y. Zheng, V. Zhilich, D. Žontar, 12 and D. Zürcher

As the critical dimension (CD) becomes smaller, various resolution enhancement techniques (RET) are widely adopted. In developing sub-100nm devices, the complexity of optical proximity correction (OPC) is severely increased and applied OPC layers are expanded to non-critical layers. The transformation of designed pattern data by OPC operation causes complexity, which cause runtime overheads to following steps such as mask data preparation (MDP), and collapse of existing design hierarchy. Therefore, many mask shops exploit the distributed computing method in order to reduce the runtime of mask data preparation rather than exploit the design hierarchy. Distributed computing uses a cluster of computers that are connected to local network system. However, there are two things to limit the benefit of the distributing computing method in MDP. First, every sequential MDP job, which uses maximum number of available CPUs, is not efficient compared to parallel MDP job execution due to the input data characteristics. Second, the runtime enhancement over input cost is not sufficient enough since the scalability of fracturing tools is limited. In this paper, we will discuss optimum load balancing environment that is useful in increasing the uptime of distributed computing system by assigning appropriate number of CPUs for each input design data. We will also describe the distributed processing (DP) parameter optimization to obtain maximum throughput in MDP job processing.

We have performed a search for the lepton-flavor-violating decay tau-->microgamma using a data sample of 86.3 fb(-1) accumulated by the Belle detector at KEK. No evidence for a signal is seen, and we set an upper limit for the branching fraction of B(tau-->microgamma)<3.1 x 10(-7) at the 90% confidence level.

Sub-100 nm lithography has been realized recently in the IC industry. The resolution enhancement techniques (RET) and optical proximity effect correction (OPC) require more complicated mask patterns. It is therefore, very important to simulate and calculate mask error enhanced factor (MEEF), and critical dimension (CD) variations on the mask and wafer correctly using optical simulation tool before manufacturing. However, the expectations of MEEF and CD error using the in-house optical simulation tool, Topo, are larger than those of the experimental result. These are caused by many reasons. The ignorance of the vector property of light could be one reason. In case of using higher numerical aperture (NA), the vector property of light, such as polarization, should be taken into account when calculation of printed image on wafer. Also, the ignorance of the local CD error caused by the neighborhood could be another reason. The second issue described above has been studied using the Monte Carlo (MC) method, a commonly used statistical method. We assume that all of the factors follow the normal curve with a certain standard deviation. This assumption is sufficient for studying local CD error by the MC method. When the local CD variation on the mask for the design rule 110 nm is 3 nm in its 3σ, CD variation of approximately 2.0 nm on wafer is expected by the MC method. This result is fairly comparable with experimental one, when the MEEF is about 2.7 locally. We obtain another MEEF value, around 4.1 globally, when the mask CD deviates from the target CD by ±12 nm in 3σ. This study shows that the MC method gives a result close to that of the experimental one greater than 2.5 of MEEF locally.

We report the results of a search for ${B}^{\ensuremath{-}}\ensuremath{\rightarrow}J/\ensuremath{\psi}\ensuremath{\Lambda}\overline{p}$ based on a data set of $78{\mathrm{fb}}^{\ensuremath{-}1}$ data collected at the $\ensuremath{\Upsilon}(4S)$ resonance with the Belle detector at the KEKB asymmetric ${e}^{+}{e}^{\ensuremath{-}}$ collider. No substantial signal is found, and we set the branching fraction upper limit $\mathcal{B}{(B}^{\ensuremath{-}}\ensuremath{\rightarrow}J/\ensuremath{\psi}\ensuremath{\Lambda}\overline{p})<4.1\ifmmode\times\else\texttimes\fi{}{10}^{\ensuremath{-}5}$ at 90% confidence level.

We have performed a search for the lepton-flavor-violating decay tau -> mu gamma using a data sample of 86.3fb^{-1} accumulated by the Belle detector at KEK. No evidence for a signal is seen, and we set an upper limit for the branching fraction of B(tau -> mu gamma) < 3.1 x 10^{-7} at the 90% confidence level.

We report the observation of a narrow charmoniumlike state produced in the exclusive decay process ${B}^{\ifmmode\pm\else\textpm\fi{}}\ensuremath{\rightarrow}{K}^{\ifmmode\pm\else\textpm\fi{}}{\ensuremath{\pi}}^{+}{\ensuremath{\pi}}^{\ensuremath{-}}J/\ensuremath{\psi}$. This state, which decays into ${\ensuremath{\pi}}^{+}{\ensuremath{\pi}}^{\ensuremath{-}}J/\ensuremath{\psi}$, has a mass of $3872.0\ifmmode\pm\else\textpm\fi{}0.6\mathrm{(}\mathrm{s}\mathrm{t}\mathrm{a}\mathrm{t}\mathrm{)}\ifmmode\pm\else\textpm\fi{}0.5\mathrm{(}\mathrm{s}\mathrm{y}\mathrm{s}\mathrm{t}\mathrm{)}\text{ }\text{ }\mathrm{M}\mathrm{e}\mathrm{V}$, a value that is very near the ${M}_{{D}^{0}}+{M}_{{D}^{*0}}$ mass threshold. The results are based on an analysis of 152M $B$-$\overline{B}$ events collected at the $\ensuremath{\Upsilon}(4S)$ resonance in the Belle detector at the KEKB collider. The signal has a statistical significance that is in excess of $10\ensuremath{\sigma}$.