The exponential data size growth in high-speed networks is a key motivator for nonvolatile memory development. To support this demand, higher density NAND is required: with a smaller cell size and higher interface speed. Generally, scaling down NAND technology requires addressing several common issues: 1) As the number of WL stack layers increases, the cell-string current is reduced due to the increased resistance in a cell string, 2) Deterioration of cell-to-cell interference, due to the reduction of cell pitch, 3) Support of higher IO bandwidth for faster data transfer speed [1]. Another challenge of this work was to minimize the die size because the peripheral circuit area is comparable to that of the cell array. Hence, we integrated the peripheral circuits below the cell array as introduced in [2]. Also, to cope with lower metal-contact height, a novel structure for the capacitor device was used to maximize capacitance per unit area.

In this work, we present a true 3D 128 Gb 2 bit/cell vertical-NAND (V-NAND) Flash product for the first time. The use of barrier-engineered materials and gate all-around structure in the 3D V-NAND cell exhibits advantages over 1x nm planar NAND, such as small Vth shift due to small cell coupling and narrow natural Vth distribution. Also, a negative counter-pulse scheme realizes a tightly programmed cell distribution. In order to reduce the effect of a large WL coupling, a glitch-canceling discharge scheme and a pre-offset control scheme is implemented. Furthermore, an external high-voltage supply scheme along with the proper protection scheme for a high-voltage failure is used to achieve low power consumption. The chip accomplishes 50 MB/s write throughput with 3 K endurance for typical embedded applications. Also, extended endurance of 35 K is achieved with 36 MB/s of write throughput for data center and enterprise SSD applications.