基本信息
浏览量:20
职业迁徙
个人简介
De-Qi Wen (Member, IEEE) received the B.S. degree with a major in physics and with a minor in applied mathematics and the Ph.D. degree in plasma physics from the Dalian University of Technology, Dalian, China, in 2012 and 2018, respectively.
In this period, he was also jointly trained in the University of California at Berkeley, Berkeley, CA, USA, from 2015 to 2017. Since 2018, he has been a Post-Doctoral Researcher with Michigan State University, East Lansing, MI, USA. He has authored/coauthored around 40 journal articles. He has served as a frequent referee for more than ten internationally well-known journals such as the IEEE Transactions on Plasma Science, Journal of Applied Physics, Plasma Source Science and Technology, Applied Physics Letter, Journal of Physics D: Applied Physics, Plasma of Physics, and Review of Scientific Instruments. His research interests include radio frequency plasma source including capacitive/inductive discharge especially in aspects of plasma series resonance, electromagnetic effects, sheath dynamics, electron dynamics, multipactor, plasma ionization breakdown, electromagnetic waves, applicable to microwave devices and fabrication of semiconductor, through code development/improvement, such as particle-in-cell/Monte Carlo simulation (OOPD1, XPDP1, XOOPIC, and XPDC2), and development of new model and theory.
研究兴趣
论文共 70 篇作者统计合作学者相似作者
按年份排序按引用量排序主题筛选期刊级别筛选合作者筛选合作机构筛选
时间
引用量
主题
期刊级别
合作者
合作机构
2023 IEEE International Conference on Plasma Science (ICOPS)pp.1-1, (2023)
APPLIED PHYSICS LETTERSno. 26 (2023)
PLASMA SOURCES SCIENCE & TECHNOLOGYno. 6 (2023): 064001-064001
Journal of applied physicsno. 15 (2023)
2023 IEEE International Conference on Plasma Science (ICOPS)pp.1-1, (2023)
High Voltageno. 6 (2023): 1095-1114
加载更多
作者统计
#Papers: 70
#Citation: 888
H-Index: 22
G-Index: 25
Sociability: 4
Diversity: 2
Activity: 18
合作学者
合作机构
D-Core
- 合作者
- 学生
- 导师
数据免责声明
页面数据均来自互联网公开来源、合作出版商和通过AI技术自动分析结果,我们不对页面数据的有效性、准确性、正确性、可靠性、完整性和及时性做出任何承诺和保证。若有疑问,可以通过电子邮件方式联系我们:report@aminer.cn